Tribological and wear studies of coatings fabricated by atomic layer deposition and by successive ionic layer adsorption and reaction for microelectromechanical devices

Nistorica, Corina; Liu, Jun Fu; Gory, Igor; Skidmore, George D.; Mantiziba, Fadziso M.; Gnade, Bruce E.; Kim, Jiyoung

doi:10.1116/1.1885022

Cited by 26 publications

(14 citation statements)

References 15 publications

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“…24 In particular, Venkatesan and Bhushan 24 observed the friction properties of oxidized silicon surfaces to be strongly dependent on the ambient conditions, that is, humidity. 25 The humidity dependence of the tribological properties of oxidized silicon surfaces was also observed by Nistorica et al 22 and differs from their results obtained with atomic layer deposited TiO 2 and ZrO 2 layers, where the friction coefficient was observed to remain unaffected by humidity in the case of ZrO 2 or to significantly decrease with increasing humidity in the case of TiO 2 . In humid air, however, the friction coefficient became slightly higher for oxidized silicon surfaces than for bare silicon.…”

Section: Introductionmentioning

confidence: 54%

“…58, no velocity dependence was observed; this was attributed to the fast dissipation of heat that was generated in the sliding contact. 22, the change in friction coefficient according to humidity for different surface oxides was discussed with regard to their hydrophilicity, while a sliding contact on a more hydrophobic surface was discussed to be supported by a thick water layer acting as a lubricant. 60-62 for more details).…”

Section: Discussionmentioning

confidence: 99%

“…These involve chemical modification of surfaces, 11-13 deposition of ultra-thin lubricant films, [14][15][16] and wear protective layers. [21][22][23] Native silicon oxide has been suggested as an effective wear protective layer, and its role has been investigated in the wear behavior of Si-based MEMS. [21][22][23] Native silicon oxide has been suggested as an effective wear protective layer, and its role has been investigated in the wear behavior of Si-based MEMS.…”

Section: Introductionmentioning

confidence: 99%

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Effect of surface oxidation on the nm-scale wear behavior of a metallic glass

Caron

Sharma

Shluger

et al. 2011

Journal of Applied Physics

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Metallic glasses are good candidates for applications in micromechanical systems. With size reduction of mechanical components into the micrometer and submicrometer range, the native surface oxide layer starts playing an important role in contact mechanical applications of metallic glasses. We use atomic force microscopy to investigate the wear behavior of the Ni62Nb38 metallic glass with a native oxide layer and with an oxide grown after annealing in air. After the annealing, the wear rate is found to have significantly decreased. Also the dependency of the specific wear on the velocity is found to be linear in the case of the as spun sample while it follows a power law in the case of the sample annealed in air. We discuss these results in relation to the friction behavior and properties of the surface oxide layer obtained on the same alloy. (C) 2011 American Institute of Physics. [doi:10.1063/1.3573778

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Section: Introductionmentioning

confidence: 54%

Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Effect of surface oxidation on the nm-scale wear behavior of a metallic glass

Caron

Sharma

Shluger

et al. 2011

Journal of Applied Physics

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“…Other cutting-edge avenues of exploration include bio-medicine, energy, and MEMS (micro-electro-mechanical system)/NEMS (nano-electro-system). 8,9 The remainder of the article will explore the initial ALD reaction, for its far-reaching implications in ALD processes such as 3D conformal coating. Also included in the discussion will be the use of ALD in nanotechnology.…”

Section: Jiyoung Kim and Tae Wook Kimmentioning

confidence: 99%

Initial surface reactions of atomic layer deposition

Kim

2009

JOM

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Atomic layer deposition (ALD) is a promising thin fi lm deposition technique for sub-45 nm CMOS technology with unique capabilities, such as ultraprecise thickness control and conformal deposition on high aspect ratio threedimensional nanostructures, and so on. The operating principle of ALD is a self-limited surface reaction between species formed by the discretely pulsed precursor vapors and the reaction surface. It is possible to theoretically calculate the ideal deposition thickness from the growth rate and the number of cycles performed, but the initial growth rate is often non-linear. Understanding the initial growth mechanics is crucial for the use of ALD on thin gate dielectric processes as well as nanotechnology. The fi lm growth during the fi rst few cycles of deposition may be linear, enhanced, or inhibited. This paper gives a brief overview on the basics of ALD operation, and attempts to explain what factors into the initial growth by discussing interface formation, etching, and passivation behaviors. Also addressed is the application of novel ALD techniques in nanotechnology for patterning and nanomaterials. Jiyoung Kim and Tae Wook Kim are with the Department of Electrical Engineering, University of Texas at Dallas, 800 W. Campbell Rd., Richardson, TX 75080. Dr. Kim is also with the Department of Materials Science and Engineering and can be reached at jiyoung.kim@utdallas.edu.

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“…Also, deposition of hard materials such as W [9], DLC [10], and SiC [11] has been considered as an alternative method to improve durability. In addition, various metal oxide films have been suggested as protective coatings for microsystems [12][13][14][15].…”

Section: Introductionmentioning

confidence: 99%

Effects of Self-Assembled Monolayer and PFPE Lubricant on Wear Characteristics of Flat Silicon Tips

et al. 2008

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The effects of self-assembled monolayer (SAM) and perfluoropolyether (PFPE) lubricant on the wear characteristics of flat silicon tips were investigated. The wear test consisted of sliding the silicon tips fabricated on a flat silicon specimen against SAM and PFPE (Z-tetraol) coated silicon (100) wafer. The tips were slid at a low speed for about 15 km under an applied load of 39.2 lN. The wear volume of the tip was obtained by measuring the tip profile using an Atomic Force Microscope (AFM). It was found that the coatings were effective in reducing the wear of the tips by an order of magnitude from 10 -6 to 10 -7 .

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Tribological and wear studies of coatings fabricated by atomic layer deposition and by successive ionic layer adsorption and reaction for microelectromechanical devices

Cited by 26 publications

References 15 publications

Effect of surface oxidation on the nm-scale wear behavior of a metallic glass

Effect of surface oxidation on the nm-scale wear behavior of a metallic glass

Initial surface reactions of atomic layer deposition

Effects of Self-Assembled Monolayer and PFPE Lubricant on Wear Characteristics of Flat Silicon Tips

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