1995
DOI: 10.1016/0043-1648(95)90173-6
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Tribological behavior of silicon nitride materials under unlubricated sliding between 22°C and 1000°C

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Cited by 44 publications
(44 citation statements)
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“…Aerosol spraying of additional H-BN to replace, in part, the H-BN preferentially removed during polishing process yielded modest reductions in friction coefficient. The coefficients obtained were typical of those for sintered Si 3 N 4 under dry sliding conditions, as have been reported by previous investigators [21,32].…”
Section: Discussionsupporting
confidence: 60%
See 1 more Smart Citation
“…Aerosol spraying of additional H-BN to replace, in part, the H-BN preferentially removed during polishing process yielded modest reductions in friction coefficient. The coefficients obtained were typical of those for sintered Si 3 N 4 under dry sliding conditions, as have been reported by previous investigators [21,32].…”
Section: Discussionsupporting
confidence: 60%
“…Graphite and other solid lubricants have been incorporated into ceramic matrices in order to improve their tribological responses [19][20][21]. In particular, hexagonal boron nitride (H-BN) has been used extensively in ceramics as a solid lubricant due to its high lubricity and resistance to corrosion and oxidation to moderately high temperatures [22].…”
Section: Introductionmentioning
confidence: 99%
“…This structure of hBN can easily be sheared along the basal plane of hBN, thus qualifying its role as a solid lubricant additive. There are several research investigations that report the role of hBN in reducing friction in various tribological applications [2][3][4].…”
Section: Introductionmentioning
confidence: 99%
“…The oxygen atoms incorporated therein may react with the Si 3 N 4 network forming silicon oxynitride or silicon oxide. Indeed, tribological properties ͑friction and wear rate͒ of monolithic Si 3 N 4 containing different crystalline phases were reported 45 showing that the friction coefficient and wear rate were reduced when surface layers, such as SiO 2 , and SiO x N y , were formed during tribological tests at 1000°C. However, when the tests were performed at 400°C, no reduction in the wear rate and friction coefficient was observed, since at this temperature no significant layer of silicon oxynitride or silicon oxide is formed, as shown in this work.…”
Section: Mechanical and Structural Properties Of Si 3 N 4 Films Amentioning
confidence: 99%
“…This should improve the solid lubricant effect of the silicon oxynitride layer in tribological applications at high temperatures, as reported for bulk Si 3 N 4 . 45 To confirm the hypothesis of silicon oxynitride formation during annealing, XPS measurements were performed to evaluate the N and Si chemical ambient in the annealed and as-deposited films. Figure 10͑a͒ at 1000°C ͑solid triangles͒.…”
Section: Mechanical and Structural Properties Of Si 3 N 4 Films Amentioning
confidence: 99%