Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure

Ermolenko, M. V.; Zavadski, S. M.; Голосов, Д. А.; Мельников, С. Н.; Zamburg, Evgeny

doi:10.3103/s1068366616030065

Cited by 6 publications

(6 citation statements)

References 10 publications

(22 reference statements)

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“…For the films deposited at 15 and 20 sccm of N 2 , the wear track depths were about 0.75 and 0.70 lm, respectively, signifying the fact that increasing nitrogen content in the films enhances the film wear resistance [1]. Moreover, the wear tracks revealed a small amount of debris that indicating an improved tribological performance of the films with increasing nitrogen content in the VN thin films (Fig.…”

Section: Friction Behavior and Wear Resistancementioning

confidence: 86%

“…The hard phases corresponding to transition metal nitrides are capable of retaining their mechanical properties such as strength and hardness under extreme conditions, because of which, they have been receiving considerable attention in the recent past [1][2][3]. Vanadium nitride (VN) is one such transition metal nitride, which has found its way in a wide variety of applications in many industrial fields, owing to their excellent properties such as high hardness and wear resistance, good electrical and thermal conductivity [4,5], good catalytic activity, and excellent thermal stability [6][7][8].,.…”

Section: Introductionmentioning

confidence: 99%

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Investigating the effect of nitrogen on the structural and tribo-mechanical behavior of vanadium nitride thin films deposited using R.F. magnetron sputtering

et al. 2021

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Magnetron sputtering is one of the most commonly used deposition techniques, which has received considerable attention in industrial applications. In particular, owing to its compatibility with conventional fabrication processes, it can produce and fabricate high-quality dense thin films of a wide range of materials. In the present study, nitrogen (N) was combined with pure vanadium in order to form binary nitride to improve its mechanical and tribological performance. To evaluate the influence of nitrogen on the structure of the as-deposited vanadium nitride (VN) coatings, the following techniques were used: XPS, XRD, SEM, AFM and optical profilometry. The residual stresses were determined by the curvature method using Stoney’s formula. The hardness and Young’s modulus were obtained by nanoindentation measurements. The friction behavior and wear characteristics of the films were evaluated by using a ball-on-disk tribometer. The obtained results showed that the N/V ratio increased with increasing the N2 flow rate while the deposition rate decreased. The preferred orientation was changed from (200) to (111) as the N2 flow rate increased with the presence of V–N and V–O binding energies as confirmed by XPS analysis. The nitrogen addition resulted in a columnar morphology and a fine structure with fine surface roughness. The VN thin film containing 49.5 at.% of nitrogen showed the best performance: highest mechanical properties (hardness = 25 GPa), lowest friction coefficient (μ = 0.37) and lowest wear rate (Ws = 2.72 × 10−5 mm3N−1 m−1). A good correlation between the film microstructure, crystallite size, residual stress and mechanical and tribological properties was observed.

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Section: Friction Behavior and Wear Resistancementioning

confidence: 86%

Section: Introductionmentioning

confidence: 99%

Investigating the effect of nitrogen on the structural and tribo-mechanical behavior of vanadium nitride thin films deposited using R.F. magnetron sputtering

et al. 2021

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“…Similar results in CrN were reported by Ren et al [ 45 ]. Reducing the disposition pressure significantly decreased the COF and the wear rate, in other words, improving the wear resistance of the coating [ 20 , 48 ].…”

Section: Resultsmentioning

confidence: 99%

“…The introduction of CeO 2 has been shown to improve the oxidative wear resistance of Fe–Ni–Cr alloy coatings [ 48 , 49 ]. The tribological properties of CrAgCeN coatings were enhanced by the addition of Ce, which reduced the COF.…”

Section: Resultsmentioning

confidence: 99%

Effects of Deposition Pressure on the Microstructural and Tribological Properties of CrAgCeN Coatings Prepared by Magnetron Sputtering

et al. 2023

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This study investigates the effect of deposition pressure on the microstructure and tribological properties of CrAgCeN coatings synthesized via unbalanced magnetron sputtering. The CrAgCeN coatings presented a face-centered cubic structure. As the deposition pressure increased, the surface grain topography of the CrAgCeN coatings transformed from a looser pyramidal structure to a denser structure, while their hardness H and elastic modulus E first increased and then decreased. The strengthening effect was mainly attributable to Ag and Ce elements. Conversely, the coefficient of friction (COF) and wear rates of the coatings reduced and then increased. Under 0.6-Pa deposition pressure, the COF and wear rate of the CrAgCeN coating were minimized (0.391 and 3.2 × 10−7 mm3/(N·m), respectively) while the H and E were maximized (14.2 and 206.2 GPa, respectively). The values of hardness, wear resistance, resistance of elastic strain to failure (H/E) and resistance to plastic deformation (H3/E2) were improved for the coatings by Ce. The wear mechanisms were adhesion and delamination. The wear mechanisms were adhesion and delamination. Selecting the appropriate deposition pressure can improve the tribological properties of the CrAgCeN coatings. The received results of research in this study allow us to establish a rational coating composition for deposition on tools providing an increase in machining efficiency of the materials used in engineering. CrAgCeN coating with excellent properties may be applied to steel substrate through the combined action of corrosion, high temperature and mechanics.

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“…Over the past several years, TiN x thin films were extensively applied in the electronic and decoration industries due to their unique properties, such as extreme hardness, a high melting point, a high thermal conductivity, and a high resistance to corrosion etc [1][2][3][4][5]. In electronics, TiN x films can be used to process Π-type attenuators with outstanding properties [6,7], form very fine Schottky barrier contacts to Si and GaAs that are suitable for high temperature applications [1], make excellent ohmic contact on AlGaN/GaN layers to manufacture wide band gap AlGaN/GaN high electron mobility transistors [8], and process an embedded TiN source/drain structure to decrease parasitic resistance of an n-MOSFET [9].…”

Section: Introductionmentioning

confidence: 99%

Titanium nitride thin film for temperature sensing and its conductive mechanism in the cryogenic region

Lin

Zhan

Wang

et al. 2018

Semicond. Sci. Technol.

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Titanium nitride (TiN x ) thin films were deposited by DC magnetron sputtering on polished and oxidized silicon wafers under different N 2 flow rates, and temperature sensors based on the TiN x films were fabricated. The performance of three typical sensors were measured in the temperature range of 4.2 K-300 K, and the results indicate that TiN x thin film sensors are suitable for cryogenic temperature measurements. Furthermore, the conduction mechanism of TiN x thin film in the temperature range of 4.2 K-300 K was studied for the first time, and it can be described by an impurity conduction mechanism. Finally, the contribution of the grain and grain boundary on the film resistance and temperature coefficient of resistance was studied by AC impedance analysis, and the characterization result indicates that the impurity conduction mechanism of the TiN x thin film is dominated by the grain.

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Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure

Cited by 6 publications

References 10 publications

Investigating the effect of nitrogen on the structural and tribo-mechanical behavior of vanadium nitride thin films deposited using R.F. magnetron sputtering

Investigating the effect of nitrogen on the structural and tribo-mechanical behavior of vanadium nitride thin films deposited using R.F. magnetron sputtering

Effects of Deposition Pressure on the Microstructural and Tribological Properties of CrAgCeN Coatings Prepared by Magnetron Sputtering

Titanium nitride thin film for temperature sensing and its conductive mechanism in the cryogenic region

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