Triple-wavelength, narrowband Mg/SiC multilayers with corrosion barriers and high peak reflectance in the 25-80 nm wavelength region

Fernández-Perea, Mónica; Soufli, Régina; Robinson, Jeffrey A.; Marcos, Luis RodrÃ­guez De; Méndez, José A.; Larruquert, Juan I.; Gullikson, Eric M.

doi:10.1364/oe.20.024018

Cited by 36 publications

(20 citation statements)

References 42 publications

(51 reference statements)

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“…Below 65 nm, single layers of a few metals like Pt [9,10], Ir [11], and Os [12], have a relatively high reflectance of up to ~20-35% in the ~45-70 nm range. In spite of the lack of transparent materials, moderately high reflectance, narrowband multilayer coatings based on the transparency of Sc [13][14][15], Tb [16,17], Gd [18], Yb [19], Eu [20], and Mg [21] films have been developed recently.…”

Section: Introductionmentioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp 3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. 5962-5963 (1994). 9. G. F. Jacobus, R. P. Madden, and L. R. Canfield, "Reflecting films of platinum for the vacuum ultraviolet," J.Opt. Soc. Am. 53(9), 1084-1088 (1963). 10. W. R. Hunter, D. W. Angel, and G. Hass, "Optical properties of evaporated platinum films in the vacuum ultraviolet from 220 Å to 150 Å," J. Opt. Soc. Am. 69(12), 1695-1699 (1979). 11. G. Hass, G. F. Jacobus, and W. R. Hunter, "Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Å to 2000 Å," J. Opt. Soc. Am. 57(6), 758-762 (1967). 12. J. T. Cox, G. Hass, J. B. Ramsey, and W. R. Hunter, "Reflectance and optical constants of evaporated osmium in the vacuum ultraviolet from 300 to 2000 Å," J. Opt. Soc. Am. 63(4), 435-438 (1973 Robertson, "Density, sp 3 fraction, and cross-sectional structure of amorphous carbon films determined by x-ray reflectivity and electron energy-loss spectroscopy," Phys. Rev. B 62(16), 11089-11103 (2000). 32. F. Xiong, Y. Y. Wang, and R. P. H. Chang, "Complex dielectric function of amorphous diamond films deposited by pulsed-excimer-laser ablation of graphite," Phys. Rev. B Condens. Matter 48(11), 8016-8023 (1993). 33. S. Waidmann, M. Knupfer, J. Fink, B. Kleinsorge, and J. Robertson, "Electronic structure studies of undoped and nitrogen-doped tetrahedral amorphous carbon using high-resolution electron energy-loss spectroscopy," J.

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Section: Introductionmentioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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“…15 This concept was applied in a triple-band Mg/SiC multilayer by FernandezPerea et al: the first three Bragg peaks were optimized for 76.9 nm, 46.8 nm, and 33.1 nm light, respectively, as shown in Figure 1. 16 A stack of multilayers with different periods can be used to reflect at several wavelengths 17 or to further enhance the reflectance of each channel. 18 A buffer layer can be inserted in between different periodic multilayers to tune 16 the Bragg peak positions further.…”

Section: A Multi-channel Multilayer Mirrormentioning

confidence: 99%

“…16 A stack of multilayers with different periods can be used to reflect at several wavelengths 17 or to further enhance the reflectance of each channel. 18 A buffer layer can be inserted in between different periodic multilayers to tune 16 the Bragg peak positions further. This hybrid structure was demonstrated in the work of Hecquet et al to collect the emission lines from Fe and He in the range of 17.1-33.5 nm where the 1st order Bragg peak can be shifted by $5 nm.…”

Section: A Multi-channel Multilayer Mirrormentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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“…However, the issue of Mginduced corrosion led to the rejection of Mg/SiC and to its substitution with SiC/Si on the AIA flight mirrors. Recently, corrosion-resistant, high-reflectance Mg/SiC multilayers for the 250 -800 Å wavelength range have been developed and could enable use of Mg/SiC as multilayer mirror coating in future EUV solar missions and in other EUV applications 5,6,7,8 .…”

Section: Introductionmentioning

confidence: 99%