2014
DOI: 10.1063/1.4893601
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Tristate electrochemical metallization memory based in the hydrogenated nanocrystalline silicon films

Abstract: Articles you may be interested inMicrostructure factor and mechanical and electronic properties of hydrogenated amorphous and nanocrystalline silicon thin-films for microelectromechanical systems applications

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Cited by 13 publications
(4 citation statements)
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“…The reason may be that compared with the amorphous region, the carriers tend to migrate along the grain boundary. , However, the crystalline regions were randomly distributed in the pristine SF films, and the random carrier migration paths could have resulted in unstable resistance switching. As reported by Yan et al ., metallic ions can serve as a nucleus to induce the growth of crystals . Simultaneously, the introduction of metallic ions can improve memristor performance. , …”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The reason may be that compared with the amorphous region, the carriers tend to migrate along the grain boundary. , However, the crystalline regions were randomly distributed in the pristine SF films, and the random carrier migration paths could have resulted in unstable resistance switching. As reported by Yan et al ., metallic ions can serve as a nucleus to induce the growth of crystals . Simultaneously, the introduction of metallic ions can improve memristor performance. , …”
Section: Resultsmentioning
confidence: 99%
“…As reported by Yan et al, metallic ions can serve as a nucleus to induce the growth of crystals. 44 Simultaneously, the introduction of metallic ions can improve memristor performance. 45,46 On the above bases, we fabricated SF-based functional layers containing different Ag contents and then studied their impact on the resistance switching performance.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…After a forward voltage is applied to the device, O vacancies are formed in the intermediate layer. The loss of O atoms may be due to the thermophoresis effect caused by Joule heating: a temperature gradient caused by the increased current drives the lighter ions away from the channel region . To confirm the increase of oxygen vacancies and valence change of elements of the whole functional layer below the Al electrode, the XPS at different depth of the device was analyzed.…”
Section: Resultsmentioning
confidence: 99%
“…However forming-free bipolar resistive switching performance from the as-deposited nc-Si with Si dangling bond RRAM device has not been covered yet. Moreover, the in situ growth of silicon-based resistive materials on the silicon substrate will greatly increase the reliability of devices and provide a good platform for the industrialization of silicon-based memory devices [13][14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%