Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)

Kou, Zihan; Wang, Chao; Zhou, Wenjin; Chen, Ailian; Chen, Yang

doi:10.1016/j.apsusc.2024.159733

Applied Surface Science

2024

DOI: 10.1016/j.apsusc.2024.159733

|View full text |Cite

Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)

Zihan Kou,

Chao Wang,

Wenjin Zhou

et al.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2024

2025

Publication Types

Select...

Article5

Relationship

Self Cite0

Independent5

Authors

Journals

Cited by 11 publications

References 69 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

Experimental study and DFT+U calculations on the impact of Rare-Earth ion (La3+, Sm3+, Y3+, Yb3+) doped CeO2 Core-Shell abrasives on polishing performance

An,

Wang,

Tang

et al. 2024

Applied Surface Science

View full text Add to dashboard Cite

Experimental study and DFT+U calculations on the impact of Rare-Earth ion (La3+, Sm3+, Y3+, Yb3+) doped CeO2 Core-Shell abrasives on polishing performance

An,

Wang,

Tang

et al. 2024

Applied Surface Science

View full text Add to dashboard Cite

Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism

Zhu,

Ding,

et al. 2025

Applied Surface Science

View full text Add to dashboard Cite

Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping

Zhang,

Wang,

Wang

et al. 2025

Applied Surface Science

View full text Add to dashboard Cite

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)

Cited by 11 publications

References 69 publications

Experimental study and DFT+U calculations on the impact of Rare-Earth ion (La3+, Sm3+, Y3+, Yb3+) doped CeO2 Core-Shell abrasives on polishing performance

Experimental study and DFT+U calculations on the impact of Rare-Earth ion (La3+, Sm3+, Y3+, Yb3+) doped CeO2 Core-Shell abrasives on polishing performance

Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism

Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping

Contact Info

Product

Resources

About