True polarization characteristics of hyper-NA optics excluding impact of measurement system

Abstract

High lens numerical aperture for improving the resolution of a lithographic lens requires a high incident angle of exposure light in resist, which induces the vectorial effect. As a result, the vectorial effect has become more sensitive and vectorial fingerprint with higher accuracy has been required for effective image forming simulation. We successfully obtained true polarization characteristics of projection optics without the effect of measurement optics for more accurate image forming simulation. Accuracy of the result of separating Jones matrix of projection optics and that of measurement optics are presented.