2018
DOI: 10.1016/j.diamond.2018.09.003
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Tunable coloration of diamond films by encapsulation of plasmonic Ag nanoparticles

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Cited by 3 publications
(2 citation statements)
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“…The same peak is also observed in the 3:1 CH 4 /Ar ratio grown sample but not in the 1:1, possibly due to low film thickness and the poor fitting convergence of the latter. This peak is assigned to the LSPR of Ag as [14,40,41], which is more pronounced in comparison with HDLC:Cu as expected.…”
Section: Hdlc With Metal Npssupporting
confidence: 74%
“…The same peak is also observed in the 3:1 CH 4 /Ar ratio grown sample but not in the 1:1, possibly due to low film thickness and the poor fitting convergence of the latter. This peak is assigned to the LSPR of Ag as [14,40,41], which is more pronounced in comparison with HDLC:Cu as expected.…”
Section: Hdlc With Metal Npssupporting
confidence: 74%
“…An initial diamond layer of ∼100 nm thickness was first grown by microwave plasma enhanced chemical vapor deposition (PECVD). In the second step, Ag nanoparticles were formed by deposition of a thin continuous Ag film onto the diamond substrate, which was then dewetted by placing the sample into the microwave chamber in the presence of pure hydrogen. , Finally, a second diamond layer with embedded SiV centers was grown using conditions identical to those used in thegrowth of the first diamond layer. The presence of the Si wafer under the sample acted as the source of Si for the SiV centers.…”
Section: Methodsmentioning
confidence: 99%