Tunable ion flux density and its impact on AlN thin films deposited in a confocal DC magnetron sputtering system

Trant, Mathis; Fischer, Maria; Thorwarth, Kerstin; Gauter, Sven; Patscheider, Jörg; Hug, Hans J.

doi:10.1016/j.surfcoat.2018.04.091

Cited by 10 publications

(2 citation statements)

References 26 publications

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“…The higher deposition rates observed using the stronger field configuration is also beneficial for the thin film properties, as it will reduce the incorporation of oxygen during deposition. Therefore, the stronger field magnet setup (mounted in open field configuration [7]) was used for both target materials during subsequent film fabrication.…”

Section: Plasma Diagnostics 311 Influence Of Magnetic Field Strengthmentioning

confidence: 99%

“…Thin films of AlN have been deposited by a range of techniques, including metalorganic chemical vapour deposition (MOCVD) [5] and physical vapour deposition (PVD) techniques, e.g. direct current magnetron sputtering (DCMS) [6,7] and high power impulse magnetron sputtering (HiPIMS) [8][9][10][11]. With a wider range of tuneable process parameters, the possibility of depositing at lower temperatures and obtaining films with lower surface roughness than via CVD, magnetron sputtering has become the method of choice for the deposition of AlN and AlScN films.…”

Section: Introductionmentioning

confidence: 99%

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Deposition and Characterisation of C-Axis Oriented Alscn Thin Films Via Microwave Plasma-Assisted Reactive Hipims

Lapeyre¹,

Hain²,

Sturm³

et al. 2022

Preprint

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Section: Plasma Diagnostics 311 Influence Of Magnetic Field Strengthmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Deposition and Characterisation of C-Axis Oriented Alscn Thin Films Via Microwave Plasma-Assisted Reactive Hipims

Lapeyre¹,

Hain²,

Sturm³

et al. 2022

Preprint

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Beyond Structural Stabilization of Highly‐Textured AlN Thin Films: The Role of Chemical Effects

Pshyk,

Patidar,

Alinezhadfar

et al. 2024

Adv Materials Inter

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The crystalline quality and degree of c‐axis orientation of hexagonal AlN thin films correlate directly with their functional properties. Therefore, achieving AlN thin films of high crystalline quality and texture is of extraordinary importance for many applications, but particularly in electronic devices. This systematic study reveals, that the growth of c‐axis‐orientated AlN thin films can be governed by a chemical stabilization effect in addition to the conventionally known structural, strain‐induced, stabilization mechanism. The promotion of in‐plane growth of AlN grains with c‐axis out‐of‐plane orientation is demonstrated on Y, W, or Al seed layers with different thicknesses and crystallinity preliminary exposed to N2 at room temperature. It is established that the stabilization mechanism is chemical in nature: the formation of an N‐rich surface layer on the metal seed layers upon exposure to N2 pre‐determines the polarity of AlN islands at the initial stages of thin film growth while the low energy barrier for the subsequent coalescence of islands of the same polarity contributes to grain growth. These results suggest that the growth of c‐axis oriented AlN thin films can be optimized and controlled chemically, thus opening more pathways for energy‐efficient and controllable AlN thin film growth processes.

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Microstructure and Mechanical Properties of Multilayered α-AlN/α-BCN Coatings Depending on Flux Density During Target B4C Sputtering

Иващенко

Rogoz

Kołtunowicz

et al. 2019

Lecture Notes in Mechanical Engineering

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Tunable ion flux density and its impact on AlN thin films deposited in a confocal DC magnetron sputtering system

Cited by 10 publications

References 26 publications

Deposition and Characterisation of C-Axis Oriented Alscn Thin Films Via Microwave Plasma-Assisted Reactive Hipims

Deposition and Characterisation of C-Axis Oriented Alscn Thin Films Via Microwave Plasma-Assisted Reactive Hipims

Beyond Structural Stabilization of Highly‐Textured AlN Thin Films: The Role of Chemical Effects

Microstructure and Mechanical Properties of Multilayered α-AlN/α-BCN Coatings Depending on Flux Density During Target B4C Sputtering

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