2018
DOI: 10.3390/ma11122494
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Tunable Luminescent A-SiNxOy Films with High Internal Quantum Efficiency and Fast Radiative Recombination Rates

Abstract: In this work, we systematically investigated the Nx bonding defects that induced high photoluminescence internal quantum efficiencies (PL IQEs) and very fast radiative recombination processes in amorphous silicon oxynitride (a-SiNxOy) systems. The luminescent N‒Si‒O bonding-related defect states were checked for the XPS, EPR, and temperature-dependent steady-state PL (TD-SSPL) properties. The PL IQEs were calculated from PL quantum yields through the principle of planar geometry optics, and then confirmed by t… Show more

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Cited by 1 publication
(5 citation statements)
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“…The detailed temperature-dependent PL QY values for various R are listed in Table 2 . One can see that, for various R, the variation tendency of the PL QY values was consistent with the variation tendency of N x defect densities [ 32 ], indicating that luminescent N x defects were responsible for the high PL internal quantum efficiencies in our a-SiN x O y systems. The a-SiN x O y samples with R = 1 had a PL QY value of approximately 14.23% ± 0.15% at the lowest temperature range (~8 K), as shown in Figure 9 f.…”
Section: Resultssupporting
confidence: 65%
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“…The detailed temperature-dependent PL QY values for various R are listed in Table 2 . One can see that, for various R, the variation tendency of the PL QY values was consistent with the variation tendency of N x defect densities [ 32 ], indicating that luminescent N x defects were responsible for the high PL internal quantum efficiencies in our a-SiN x O y systems. The a-SiN x O y samples with R = 1 had a PL QY value of approximately 14.23% ± 0.15% at the lowest temperature range (~8 K), as shown in Figure 9 f.…”
Section: Resultssupporting
confidence: 65%
“…By using Equation (1), for the PL peak range of 2.06–2.95 eV, the a-SiN x O y films were found to have PL QY values ranging from approximately 2% to 10% in the visible range at room temperature, as listed in Table 2 . The PL QY of 10.08% ± 0.95 has been achieved at E PL = 2.6 eV, which is higher than those of reported nc-Si-embedded Si-based thin films [ 17 ], a-SiN x O y films [ 32 ], and a-SiC x O y films [ 36 ].…”
Section: Resultsmentioning
confidence: 64%
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