2011
DOI: 10.1103/physrevb.83.235410
|View full text |Cite
|
Sign up to set email alerts
|

Tunable magnetoresistance behavior in suspended graphitic multilayers through ion implantation

Abstract: We report a tunable magnetoresistance (MR) behavior in suspended graphitic multilayers through point defect engineering by ion implantation. We find that ion implantation drastically changes the MR behavior: the linear positive MR in pure graphitic multilayers transforms into a negative MR after introducing significant short-range disorders (implanted boron or carbon atoms), consistent with recent non-Markovian transport theory. Our experiments suggest the important role of the non-Markovian process in the int… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

1
3
0

Year Published

2011
2011
2012
2012

Publication Types

Select...
5

Relationship

3
2

Authors

Journals

citations
Cited by 6 publications
(4 citation statements)
references
References 31 publications
1
3
0
Order By: Relevance
“…The dI/dV anomalies appear to be asymmetric with respect to V d , possibly owing to the different scattering strength for electrons and holes. We note that similar high energy anomalies with the electron-hole asymmetry are observed in different devices 22 , indicating its potential origin from optical phonon scattering.…”
supporting
confidence: 76%
“…The dI/dV anomalies appear to be asymmetric with respect to V d , possibly owing to the different scattering strength for electrons and holes. We note that similar high energy anomalies with the electron-hole asymmetry are observed in different devices 22 , indicating its potential origin from optical phonon scattering.…”
supporting
confidence: 76%
“…We also note that such dI/dV anomalies are not induced by defects scattering, since we do not observe such dI/dV anomalies in samples where we purposely introduced defects through ion-beam implantation. [15] The most likely origin of the high-energy dI/dV anomalies is the inelastic scattering of injected high-energy electrons through emission of phonons. [16][17][18] In this scenario, the probability of phonon emission processes is determined by the phonon density of states and the electron-phonon coupling strength.…”
Section: Resultsmentioning
confidence: 99%
“…Nevertheless, irradiation damage can accumulate with increasing ion dose, so that the operation of graphene as an ion-transparent but gas-separating membrane depends crucially on its ability to withstand continuous irradiation during the experiment. Although the ion irradiation response of graphene has been recently studied both experimentally [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] and theoretically [9,27,28], the atomic-scale details of damage accumulation during continuous exposure to the ion beam remain unknown. In the experiments, ion doses were either very low creating only spatially well-separated defects or so high that graphene was completely destroyed, and it was not possible to get any insight into damage accumulation process.…”
mentioning
confidence: 99%