2022
DOI: 10.1038/s41467-022-32987-6
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Tunable metasurfaces via the humidity responsive swelling of single-step imprinted polyvinyl alcohol nanostructures

Abstract: The application of hydrogels in nanophotonics has been restricted due to their low fabrication feasibility and refractive index. Nevertheless, their elasticity and strength are attractive properties for use in flexible, wearable-devices, and their swelling characteristics in response to the relative humidity highlight their potential for use in tunable nanophotonics. We investigate the use of nanostructured polyvinyl alcohol (PVA) using a one-step nanoimprinting technique for tunable and erasable optical secur… Show more

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Cited by 61 publications
(29 citation statements)
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“…Note that the plasmonic device is just a proof‐of‐concept demonstration, in which the laboratory‐level FIB milling process is sufficient. Scalable and cost‐effective large area device production can easily enabled by combining our TSSG process with nanoimprint [ 48 ] or deep ultraviolet photo‐lithography [ 49 ] well‐established in the advanced optoelectronic industry.…”
Section: Resultsmentioning
confidence: 99%
“…Note that the plasmonic device is just a proof‐of‐concept demonstration, in which the laboratory‐level FIB milling process is sufficient. Scalable and cost‐effective large area device production can easily enabled by combining our TSSG process with nanoimprint [ 48 ] or deep ultraviolet photo‐lithography [ 49 ] well‐established in the advanced optoelectronic industry.…”
Section: Resultsmentioning
confidence: 99%
“…[174][175][176] The engineering of materials to suppress optical losses could be influential in designing meta-atoms with unity transmission, [177][178][179] allowing for highly efficient metasurfaces, and therefore, easing the limitations of how many metasurfaces can be cascaded in the hidden layers of ONNs. In addition, large-scale fabrication techniques, such as nanoimprint lithography, [180][181][182][183][184][185][186][187] holographic lithography, 188 and self-assembly, [189][190][191] could allow for the mass production of metasurfaces for ONNs. Together with advancements in nonlinear responses, 192 deep ONNs with nonlinear activation functions could be a reality.…”
Section: Discussionmentioning
confidence: 99%
“…Nanoimprint lithography (NIL) is a low-cost, high-throughput, and high-resolution patterning method that involves the use of a soft stamp. It has been actively researched by using various materials [3337] and combining with different fabrication methods [38] . In NIL processes, a stamp consisting of inverse patterns replicates the desired patterns on a substrate by curing the resist with ultraviolet (UV) or heat.…”
Section: Soft Lithographymentioning
confidence: 99%