2022
DOI: 10.1016/j.msea.2022.142651
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Tuning length scale effect of hardness in Ag/Nb/Cu/Nb multilayers by Nb amorphous interlayer

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Cited by 7 publications
(3 citation statements)
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“…When h = 10 nm, it is worthy to note that attenuated and broad in γ-Ni (111) peaks can be detected at 2θ between 42 • and 46 • , showing a lower crystallinity. This implies that the formation of the amorphous phase is promoted [41], resulting from disordered atom arrangements induced by more interfaces with a lower h. detected at 2θ between 42° and 46°, showing a lower crystallinity. This implies that the formation of the amorphous phase is promoted [41], resulting from disordered atom arrangements induced by more interfaces with a lower h. The cross-sectional FE-SEM images at a high magnification of the as-sputtered Ni/Ni3Al-MoW multilayers are shown in Figure 4.…”
Section: The Microstructurementioning
confidence: 99%
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“…When h = 10 nm, it is worthy to note that attenuated and broad in γ-Ni (111) peaks can be detected at 2θ between 42 • and 46 • , showing a lower crystallinity. This implies that the formation of the amorphous phase is promoted [41], resulting from disordered atom arrangements induced by more interfaces with a lower h. detected at 2θ between 42° and 46°, showing a lower crystallinity. This implies that the formation of the amorphous phase is promoted [41], resulting from disordered atom arrangements induced by more interfaces with a lower h. The cross-sectional FE-SEM images at a high magnification of the as-sputtered Ni/Ni3Al-MoW multilayers are shown in Figure 4.…”
Section: The Microstructurementioning
confidence: 99%
“…This implies that the formation of the amorphous phase is promoted [41], resulting from disordered atom arrangements induced by more interfaces with a lower h. detected at 2θ between 42° and 46°, showing a lower crystallinity. This implies that the formation of the amorphous phase is promoted [41], resulting from disordered atom arrangements induced by more interfaces with a lower h. The cross-sectional FE-SEM images at a high magnification of the as-sputtered Ni/Ni3Al-MoW multilayers are shown in Figure 4. It can be seen that the sharp interfaces are presented between alternating layers within the sputtered Ni/Ni3Al-MoW multilayers for h = 160 nm and 40 nm, and the h is consistent with the designed value of the multilayers.…”
Section: The Microstructurementioning
confidence: 99%
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