2023
DOI: 10.1088/1361-6463/acc258
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Tuning resistive switching properties of WO3−x-memristors by oxygen vacancy engineering for neuromorphic and memory storage applications

Abstract: High density memory storage capacity, in-memory computation and meuromorphic computing utilizing memristors are expected to solve the limitation of von-Neumann computing architecture. Controlling oxygen vacancy (VO) defects in metal oxide thin film based memristors holds the potential of designing resistive switching (RS) properties for memroy storage and neuromorphic applications. Herein, we report on RS characteristics of CMOS compatible WO3-x based memristors modulated by precisely controlled oxygen non-sto… Show more

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Cited by 6 publications
(5 citation statements)
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“…However, resistive switching was only obtained when the ratio of Ar to O 2 was 20:5. This result can be explained in terms of the oxygen vacancy density in the WO X layer [39] (Figure 3b).…”
Section: Resultsmentioning
confidence: 90%
See 1 more Smart Citation
“…However, resistive switching was only obtained when the ratio of Ar to O 2 was 20:5. This result can be explained in terms of the oxygen vacancy density in the WO X layer [39] (Figure 3b).…”
Section: Resultsmentioning
confidence: 90%
“…However, resistive switching was only obtained when the ratio of Ar to O was 20:5. This result can be explained in terms of the oxygen vacancy density in the WO layer [ 39 ] ( Figure 3 b). When the Ar:O ratio changed to 20:1, more oxygen vacancies were present in the WO layer, resulting in an electrically short state.…”
Section: Resultsmentioning
confidence: 99%
“…Defects: as most of the RS mechanisms depend upon the defects present in the material, engineering and controlling the defect chemistry of a material become very essential for repeatable and reliable memristive devices. 18,105 Moreover, Janus structures of TMDCs, referring to transition metal layers having different surfaces, have garnered intensive research interest in recent times in view of their exceptional features that originate because of the symmetry breaking in such structures. 106 Hence, these could play a pivotal role in tailoring the memristive characteristics of neuromorphic devices.…”
Section: Optimizing Defect Chemistry and Stoichiometrymentioning
confidence: 99%
“…62 The electric field causes anions or cations to migrate when a voltage is applied across the device, progressively forming filaments between the electrodes that alter the resistance. Oxygen vacancies are thought of as the migratory species in anion-based memristors, and oxides are typically utilized in their fabrication, 62 such as TiO 2 , 63 WO 3 , 18 etc. On the other hand, the metal cations from the electrodes form the filaments in cation-based memristors.…”
Section: Types Of Neuromorphic Devicesmentioning
confidence: 99%
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