1996
DOI: 10.1088/0268-1242/11/5/006
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Tunnel ionization of deep impurities by far-infrared radiation

Abstract: Abstract. Tunnel ionization of semiconductor deep impurity centres has been investigated in a field of far-infrared radiation where photon energies are several factors of ten smaller than the binding energy of the impurities. Depending on the radiation electric field strength, ionization is caused by phonon-assisted tunnel ionization or direct electron tunnelling. Applying high-power pulsed lasers, two types of impurities have been studied: substitutional on-site acceptors in Ge and autolocalized DX − centres … Show more

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Cited by 14 publications
(20 citation statements)
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“…2a where experimental results obtained with AlGaAs:Te at T = 150 K are shown. In this quasi-static regime the electron tunnels at the momentary magnitude of the electric field in a time shorter than the period of oscillation and thus the electric field *In the case of charged impurities (all substitutional impuritie8 investigated) a deviation from the field dependence e(E) a exp(E2 /E*2c) can be seen in relatively low field strength (up to 1 kV/cm) where the defects are thermally ionized through the Poole-Frenkel effect and the ionization probability is proportional to e(E) a exp("/Ze 3 E/K/k B T) [14,[17][18][19].…”
Section: Experimental Results and Analysismentioning
confidence: 99%
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“…2a where experimental results obtained with AlGaAs:Te at T = 150 K are shown. In this quasi-static regime the electron tunnels at the momentary magnitude of the electric field in a time shorter than the period of oscillation and thus the electric field *In the case of charged impurities (all substitutional impuritie8 investigated) a deviation from the field dependence e(E) a exp(E2 /E*2c) can be seen in relatively low field strength (up to 1 kV/cm) where the defects are thermally ionized through the Poole-Frenkel effect and the ionization probability is proportional to e(E) a exp("/Ze 3 E/K/k B T) [14,[17][18][19].…”
Section: Experimental Results and Analysismentioning
confidence: 99%
“…Such a behavior has been observed for all materials at sufficiently high temperatures. In this quasi-static regime [14,19,20] the characteristic field, which can be determined experimentally, is given by E c * 2 = 3m*h/(τ2* 3e 2) with 71 = τ2. Thus the investigation of field dependence of ionization probability allows to determine the defect tunneling time τ2.…”
Section: Experimental Results and Analysismentioning
confidence: 99%
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“…2 At not too low temperatures and not too high electric field strengths such phonon-assisted tunneling is the dominant ionization mechanism whereas at low temperatures or very high fields direct carrier tunneling from the ground state into the continuum controls the ionization process without participation of phonons. 3 In the case of deep impurities the tunneling time, which determines the transition from the quasistatic to the highfrequency regime, is the time of the redistribution of the defect vibrational system upon ionization by tunneling. 4 As long as phonons are involved in the ionization process, this time depends strongly on the temperature as well as on the details of the impurity potential structure.…”
Section: Introductionmentioning
confidence: 99%
“…The ratio of the conductivity under irradiation to the dark conductivity s i ͞s d , which is proportional to the ionization probability, is plotted as a function of the square of the peak electric field strength E. The ionization probability at this temperature and this material is independent of radiation frequency and increases with rising E like exp͑E 2 ͞E observed for all materials at sufficiently high temperatures. In this case [11,12] the characteristic field is given by E c ͑3m ‫ء‬h ͞t 3 2 e 2 ͒ 1͞2 where m ‫ء‬ is the effective mass of the carrier and t 2 h͞2k B T 6 t 1 is the defect tunneling time. Here t 1 is of the order of the impurity vibration period, and the sign depends on the type of the impurity.…”
mentioning
confidence: 99%