2015
DOI: 10.3390/mi6081023
|View full text |Cite
|
Sign up to set email alerts
|

Tunnel Junction with Perpendicular Magnetic Anisotropy: Status and Challenges

Abstract: Magnetic tunnel junction (MTJ), which arises from emerging spintronics, has the potential to become the basic component of novel memory, logic circuits, and other applications. Particularly since the first demonstration of current induced magnetization switching in MTJ, spin transfer torque magnetic random access memory (STT-MRAM) has sparked a huge interest thanks to its non-volatility, fast access speed, and infinite endurance. However, along with the advanced nodes scaling, MTJ with in-plane magnetic anisot… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
19
0

Year Published

2017
2017
2024
2024

Publication Types

Select...
7
3

Relationship

0
10

Authors

Journals

citations
Cited by 47 publications
(19 citation statements)
references
References 75 publications
0
19
0
Order By: Relevance
“…The switching current requirements of our device, important for energy efficiency, are notably set by the style of anisotropy in our output MTJ. For all the following simulations, we have assumed that the device has perpendicular magnetic anisotropy (PMA), which typically has a lower energy barrier and thus a reduced switching current compared with in-plane magnetic anisotropy (IMA) [25]. Table 1 lists the parameters used for the comparison of DW-MTJ logic with the 2018 CMOS technology node of the International Technology Roadmap for Semiconductors [26], which assumes a metal-1 half pitch of 15 nm.…”
Section: Dw-mtj Device and Adder Design A Dw-device And Its Varimentioning
confidence: 99%
“…The switching current requirements of our device, important for energy efficiency, are notably set by the style of anisotropy in our output MTJ. For all the following simulations, we have assumed that the device has perpendicular magnetic anisotropy (PMA), which typically has a lower energy barrier and thus a reduced switching current compared with in-plane magnetic anisotropy (IMA) [25]. Table 1 lists the parameters used for the comparison of DW-MTJ logic with the 2018 CMOS technology node of the International Technology Roadmap for Semiconductors [26], which assumes a metal-1 half pitch of 15 nm.…”
Section: Dw-mtj Device and Adder Design A Dw-device And Its Varimentioning
confidence: 99%
“…It can revolutionize the product performance in digital memories, particularly capable of substituting all current up-to-date memories like hard disk drives, random-access memories, and Flash memories. Among all the technology candidates, memristor-based ReRAM operates faster than phase change random access memory (PCRAM), and it possesses not a simpler, but a smaller cell structure than magnetic random access memory (MRAM) or shared transistor technology random access memory (STT-RAM) [ 3 , 4 , 5 ]. Confronted with a traditional Metal-Oxide-Semiconductor (MOS)-accessed memory cell, memristor-based RRAM bears the promising potential of forming a cross-point structure without access devices, for the sake of achieving an ultra-high density form of data storage.…”
Section: Introductionmentioning
confidence: 99%
“…TDDB is a mechanism to determine the MTJ lifetime and depends on the polarity of applied voltage, thickness variations, and other process induced damages [189]. pMTJ having an oxide barrier of size less than 1 nm designed to transmit a high-density spinpolarized current (>1 MA/cm 2 ) can cause dielectric breakdown due to self-heating, which can generate a functional error in the hybrid CMOS/MTJ circuits [117,190]. Wang et al proposed a compact model of MTJ by incorporating the phenomena of dielectric breakdown of the MgO barrier with STT stochastic behavior in which technical variations and temperature evaluation are integrated [36].…”
Section: A Brief History Of Mtj Device Modelingmentioning
confidence: 99%