We have used a low-temperature scanning tunneling microscope (STM) to study the surface of heavily doped semiconductor InAs crystals. The crystals are cleaved in situ along the (110) plane. Apart from atomically flat areas, we also observe two major types of atomic-scale defects which can be identified as S dopant atoms and As vacancies, respectively. The strong bias voltage dependence of the STM image of the impurities can be explained in terms of resonant tunneling through localized states which are present near the impurity.With the advent of the scanning tunneling microscope (STM) and the decrease of system sizes down to the nanometer scale, experimental results can often no longer be interpreted in terms of the standard model for STM imaging [1], generally for the following reasons.-For system sizes comparable to the atomic scale, the local density of states in the contact area can be greatly altered by the tunneling current (tip-sample interaction), resulting in the appearance of additional localized states near the Fermi level [2-5]. -Individual localized states start to dominate the tunneling current, because the radii of the localized states become comparable to the area of the contact size [6]. -In the presence of localized states, the finite relaxation rate of the nonequilibrium electrons has to be taken into account, especially at low temperatures where the relaxation rate may become smaller than the tunneling rate [7]. In a recent publication we showed that the STM imaging and scanning tunneling spectroscopy of InAs(110) surfaces is strongly affected by tip-induced band bending, owing to charges which are present on localized states at the tip apex [8]. Here, we present a series of additional experimental results which demonstrate the role played by individual localized states related to atomic defects. In order to identify this role, we have imaged dopant atoms and vacancies appearing at the surface of the InAs compound semiconductor at a temperature of 4.2 K.