The interaction of light with collective
charge oscillations, called
plasmon–polariton, and with polar lattice vibrations, called
phonon–polariton, are essential for confining light at deep
subwavelength dimensions and achieving strong resonances. Traditionally,
doped-semiconductors and conducting metal oxides (CMO) are used to
achieve plasmon–polaritons in the near-to-mid infrared (IR),
while polar dielectrics are utilized for realizing phonon–polaritons
in the long-wavelength IR (LWIR) spectral regions. However, demonstrating
low-loss plasmon– and phonon–polaritons in one host
material will make it attractive for practical applications. Here,
we demonstrate high-quality tunable short-wavelength IR (SWIR) plasmon–polariton
and LWIR phonon–polariton in complementary metal-oxide-semiconductor
compatible group III–V polar semiconducting scandium nitride
(ScN) thin films. We achieve both resonances by utilizing n-type (oxygen) and p-type (magnesium)
doping in ScN that allows modulation of carrier concentration from
5 × 1018 to 1.6 × 1021 cm–3. Our work enables infrared nanophotonics with an epitaxial group
III semiconducting nitride, opening the possibility for practical
applications.