“…2, 29, 40, 53 The mechanism for plasmonic-enhanced UC generation could involve enhanced near field at both the excitation and the emission. 19,21,53 In terms of contributions from the near field enhancement at the excitation wavelength (980 nm), the experiments consistently demonstrated an increase in UC emission when the laser excitation was polarized perpendicular to the slits (higher enhancement for xyx compared to the xxx configurations for the S300-slit sample, for instance -see Figure 6). Considering that the direct laser excitation of the emitters in the film is polarization-independent, the preferential emission for when the incident polarization is crossed relative to the slit direction suggests the generation of resonant near field modes at the excitation energy that contributes to the enhanced UC generation (SPP-type, according to FDTD).…”