have a lattice structure that is quite similar to that of graphene, and it has important applications in heat conduction, lubrication, hydrogen storage, battery diaphragm materials, high temperature anti-oxidation coatings, catalysis and other fields. [6] Transition metal dichalcogenides (TMDs) materials, as compared to graphene, break through the application bottleneck of zero band gap and have shown to be useful on electrical devices. [7] The ability to convert indirect bandgaps into direct bandgaps increases their applicability in optoelectronic devices even further. [8] Moreover, TMDs also have enticing qualities in the fields of magnetism and catalysis. [9][10][11] Without the controllable preparation of their solid thin films, these various applications will not be accomplished. Chemical vapor deposition (CVD) has proven to be a versatile platform for generating solid several-atom-thick films of 2D materials and is being pushed to adapt more and more manufacturing requirements via chemical reactions on a heated substrate among those as-developed techniques. Figure 1 graphically depicts the CVD growth mechanisms of graphene, h-BN and TMDs. Researchers have optimized the CVD development from a variety of perspectives over the last few decades, including improving product and pollution removal, making it more and more suitable for modern industry. [12,13] Moreover, significant progress has been made in wafer-scale preparations, [12,14] heterojunctions, [15][16][17][18] superlattices, [19,20] super-clean products, [21][22][23] and the use of liquid metal substrates, [24,25] However, other concerns still need to be solved, for example, such as the high reaction temperature, low growth rate, smallarea domains, and poor repeatability between labs. As a result, researchers have experimented with various additives to tackle these issues. By regulating kinetics, tuning sublimation temperature, minimizing flaws, and so on, this is a relatively low-cost method of improving the growth environment of 2D materials. Recent scientific research development has been satisfying. The introduction of additives has demonstrated outstanding results in terms of lowering reaction temperature, increasing reaction speed, ensuring smooth growth, and lowering nucleation density.The most recent advancements in the field of additivesassisted CVD production of 2D materials have been carefully described in this review. The additives are separated into categories based on the materials to be used and their natural forms, which mostly include vapors and solids. This section focuses on modified CVD equipments, influence factors, and product 2D materials are increasingly becoming key components in modern electronics because of their prominent electronic and optoelectronic properties. The central and premise to the entire discipline of 2D materials lie in the high-quality and scaled preparations. The chemical vapor deposition (CVD) method offers compelling benefits in terms of scalability and controllability in shaping largearea and high-quality...