2020
DOI: 10.1016/j.cplett.2020.137762
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Two-dimensional MoSe2/graphene heterostructure thin film with wafer-scale continuity via van der Waals epitaxy

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Cited by 4 publications
(4 citation statements)
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“…At present, some progress has been made in the preparation strategy and exploration of the physical properties of vdWHs of vdW materials. Many methods have been designed to prepare vdWHs, such as chemical vapor deposition growth (CVD), 103,104 physical vapor deposition/transport growth (PVD), 105,106 mechanical exfoliation and directional transfer. 107,108 For electronics, optoelectronic devices and other applications, high-quality plates are required.…”
Section: The Design Of Vdwhsmentioning
confidence: 99%
“…At present, some progress has been made in the preparation strategy and exploration of the physical properties of vdWHs of vdW materials. Many methods have been designed to prepare vdWHs, such as chemical vapor deposition growth (CVD), 103,104 physical vapor deposition/transport growth (PVD), 105,106 mechanical exfoliation and directional transfer. 107,108 For electronics, optoelectronic devices and other applications, high-quality plates are required.…”
Section: The Design Of Vdwhsmentioning
confidence: 99%
“…Presently, the dry transfer method [11], wet transfer method [12], physical vapor deposition (PVD) [13], chemical vapor deposition (CVD) [14], spray-coating process [15], and hydrothermal method [16] are usually used to construct vdWHs. The dry transfer and wet transfer methods were employed for the layer-by-layer transfer of 2DLMs in air and liquid to achieve vdWH stacking.…”
Section: Introductionmentioning
confidence: 99%
“…Both the dry transfer and wet transfer methods require the 2DLMs to be transferred and stacked layer by layer, resulting in extremely low preparation efficiency [17]. Dai et al [13] successfully constructed single-layer vdWH MoSe 2 /graphene using PVD to deposit MoSe 2 directly evaporated on the graphene surface at 650 • C. For the PVD method, MoSe 2 layers tend to raise the wrinkles and cracks at high temperatures. Han et al [18] used CVD to deposit MoS 2 on an h-BN substrate at 1050 • C to construct a single-layer vdWH MoS 2 /h-BN.…”
Section: Introductionmentioning
confidence: 99%
“…vdWHs with different interfacial morphologies exhibit different physical and chemical properties. Therefore, developing reliable assembly methods for vdWHs is a necessary prerequisite to relevant physical exploration and practical applications. A brief comparison of the current pathways for stacking vdWHs in terms of quality, controllability, efficiency, versatility, and applicability scenarios is given in Figure S1b. The experimental methods described above can control the growth by adjusting different experimental parameters. Previous hydrothermal studies have systematically investigated strong interlayer coupling and in-plane defect engineering in nanostructures by controlling reaction temperature and precursor concentration. , Magnetron sputtering technology makes it easy to obtain high-quality films in practical applications.…”
Section: Introductionmentioning
confidence: 99%