An overview of low temperature, partially-magnetized ion sources is presented. This class of devices is broadly characterized by plasma densities below 1019 m-3, electron temperatures below 100 eV, and magnetic field strength tailored such that electrons are magnetized whereas ions are not. The overarching approach is pedagogical, targeting an audience that does not necessarily have an expertise in low temperature devices. A tutorial is presented on the basic physics of operation of common ion sources including an overview of common methods for plasma generation and acceleration. A review of typical diagnostics and common applications of these plasma sources is also presented. Special attention is given to applications in plasma propulsion and materials processing. This class of ion sources is then discussed in the context of the current state of the field, key technical and scientific challenges, and future prospects.