Protecting groups are crucial tools in organic synthesis, and their involvement increases with the length of a synthetic route. However, as their number increases within the same molecule, the problem of their individual and selective removal becomes a critical issue. This is well known as the orthogonality problem. Two groups are called orthogonal if they can be removed selectively under specific reaction conditions without mutual interference, and in any given sequence [1]. Unfortunately, the dimensions in the space of orthogonal groups are limited. Such dimensions are traditionally acidic, basic, nucleophilic, reductive, and oxidative conditions. A few more exotic specific conditions exist (and are highly desirable), and photolability is clearly one of these. It is attractive because no other reagent than light is required, thus limiting the chances of interference. Of course, the intrinsic photoreactivity of the remaining functional groups of the molecule is a liability, and many of the chapters in this Handbook have covered this topic. Thus, in order to have only reactivity at the desired sitethat is, removal of the protecting groupit is necessary to have a high absorbance of that group and a high quantum yield for its cleavage, to ensure that only short irradiation times are required.As the field of photolabile protecting groups (PPGs) has been reviewed on several occasions [2][3][4][5][6][7][8], the aim of this chapter is not to update the existing catalogues of groups. Indeed, when photolability has been selected as a candidate to solve a problem, the plethora of groupssometimes with contradictory behaviors and reaction conditionsmight deter even the most daring synthetic chemist. In an attempt to better guide the experimentalist, the decision was taken to divide the groups into major families based on a specific reaction, and then to list the variations on the groups, detailing their effects on reactivity. The application of photolabile protecting groups to the chemical functions is reported in Appendix 13.6, followed by a list of typical conditions and yields for protection and deprotection procedures.Handbook of Synthetic Photochemistry. Edited