Two-Step Growth of 2D Organic–Inorganic Perovskite Microplates and Arrays for Functional Optoelectronics

Abstract

Two-dimensional (2D) perovskites have recently attracted intensive interest for their great stability against moisture, oxygen, and illumination compared with their three-dimensional (3D) counterparts. However, their incompatibility with a typical lithography process makes it difficult to fabricate integrated device arrays and extract basic optical and electronic parameters from individual devices. Here, we develop a combination of solution synthesis and a gas-solid-phase intercalation strategy to achieve hexagonal-shaped 2D perovskite microplates and arrays for functional optoelectronics. The 2D perovskite microplates were achieved by first synthesizing the lead iodide (PbI) microplates from an aqueous solution and then following with intercalation via the vapor transport method. This method further allows us to synthesize arrays of 2D perovskite microplates and create individual 2D perovskite microplate-based photodetectors. In particular, chlorine (Cl) can be efficiently incorporated into the microplates, resulting in significantly improved performance of the 2D perovskite microplate-based photodetectors.

The Role of Chloride Incorporation in Lead‐Free 2D Perovskite (BA)2SnI4: Morphology, Photoluminescence, Phase Transition, and Charge Transport

“…The theoretical calculations also reveal that Cl atoms prefer to occupy the apical positions of [PbI 6 ] 4− octahedrons in MAPbI 3 and thus it is expected that Cl incorporation concentration can reach a much higher value in 2D perovskites due to their layered nature. This has been experimentally demonstrated in 2D perovskites that a high Cl incorporation ratio can be achieved by using vapor phase growth method . Similarly, we anticipate that Cl incorporation can also be achieved in the solution‐processing 2D perovskite materials.…”

Seeds‐Assisted Space‐Confined Growth of All‐Inorganic Perovskite Arrays for Ultralow‐Threshold Single‐Mode Lasing

“…This growth process mainly contains five steps: 1) hydrophobic treatment and spin‐coating a polymethyl methacrylate (PMMA) film onto the Si/SiO 2 substrate; 2) patterning substrate by electron beam lithography (EBL) and oxygen plasma treatment; 3) cleaning the substrate by acetone, isopropanol (IPA), and deionized (DI) water; 4) the precursor solution was dropped onto the patterned Si substrate to form CsPbBr 3 seeds arrays; and 5) space‐confined vapor‐phase growth by using the seeded silicon as substrate in the modified chemical vapor deposition (CVD) growth system (detailed growth parameters are shown in Table S1, Supporting Information). [ 54–58 ]…”

“…When a drop of precursor solution flows over the surface of the substrate, only hydrophilic regions can trap precursor solution to provide the nucleation of crystal seeds while there is no residue solution left in hydrophobic regions. [ 54,56 ] These CsPbX 3 seeds play an important effect on the growth of submicron plate arrays. They may significantly surpass the fundamental crystallization barriers including the lattice mismatch and random nucleation during their growth process.…”

Interlayer-Exciton Based Nonvolatile Valleytronic Memory

“…WS 2 and WSe 2 monolayer akes were rst mechanically exfoliated onto polymethyl-methacrylate (PMMA) stamps, and then transferred on a SiO 2 (300 nm)/Si wafer using a dry transfer technique with the aid of an optical microscope and a nano-manipulator. The hydrophobic substrates were prepared via immersed in HMDS vapor for 10 min and then rinsed with acetone for 30 s to form a hydrophobic layer on the substrate 42 .…”

“…The hydrophobic substrates were prepared via immersing in HMDS vapor for 10 min and then rinsing with acetone for 30 s to form a hydrophobic layer on the substrate 47 .…”