2006
DOI: 10.1016/j.ijheatmasstransfer.2006.05.039
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Two-temperature chemically-non-equilibrium modeling of argon induction plasmas with diatomic gas

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Cited by 23 publications
(18 citation statements)
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“…The first 2T-NCE model for Ar-N 2 thermal plasma has been reported by Tanaka et al [36] which addressed 30 chemical reactions (forward and backward) for diffusion and convection terms taking into account. Two-temperature chemically-non-equilibrium modeling of argon induction plasmas with diatomic gas has been also reported later [37]. Ye et al [38,39] has developed both steady and pulse-modulated NCE model for Ar-H 2 radio frequency plasmas.…”
Section: Two-temperature Non-chemical Equilibrium (2t-nce)mentioning
confidence: 95%
“…The first 2T-NCE model for Ar-N 2 thermal plasma has been reported by Tanaka et al [36] which addressed 30 chemical reactions (forward and backward) for diffusion and convection terms taking into account. Two-temperature chemically-non-equilibrium modeling of argon induction plasmas with diatomic gas has been also reported later [37]. Ye et al [38,39] has developed both steady and pulse-modulated NCE model for Ar-H 2 radio frequency plasmas.…”
Section: Two-temperature Non-chemical Equilibrium (2t-nce)mentioning
confidence: 95%
“…Thermal plasmas provide the advanced tool for waste treatment. For the environmental problems, thermal plasmas have received much attention due to their high chemical reactivity, easy and rapid generation of high temperature, high enthalpy to enhance the reaction kinetics, oxidation and reduction atmosphere in accordance with required chemical reaction, and rapid quenching capability (10 5 -10 6 K s −1 ) to produce chemical nonequilibrium compositions [1][2][3][4][5][6][7][8][9]. Thermal plasmas have been widely applied to many fields because of these advantages.…”
Section: Introductionmentioning
confidence: 99%
“…Heating sources with a high temperature and high energy efficiency are necessary to reduce the vitrification time. Thermal plasmas have received considerable attention due to their unique advantages such as high enthalpy, high chemical reactivity, alterable oxidation or reduction atmosphere in accordance with required chemical reaction, easy and rapid generation of high temperatures, long residence time as well as rapid quenching rate [6]. Thermal plasmas, therefore, have been widely applied for material processing, such as the synthesis of nanoparticles, chemical vapor deposition (CVD) and plasma spraying [7][8][9].…”
Section: Introductionmentioning
confidence: 99%