“…The traditional contact-detection method, for example, Micro-CMM [1,2] has not satisfied the requirements of fast, highly accurate, and non-destructive detection in the microelectronics manufacturing industry. Therefore, many scholars-both domestic and foreign-have proposed non-contact optical measurement methods, such as confocal microscopy [3,4], white-light interferometry [5,6], and microscopic fringe projection [7][8][9][10]. Even if the resolution of confocal microscopy and whitelight interferometry reach nano-level, the measurement range is merely several millimeters.…”