Ultra-low density, nanostructured free-standing films for EUV Pellicles

Lima, Márcio Dias; Ueda, Takahiro; Plata, Luis; Yang, Yang; Le, Vincent; Keller, Nicklas; Huynh, Chi; Harada, Tetsuo; Kondo, Takeshi

doi:10.1117/12.2572972

Cited by 4 publications

(4 citation statements)

References 6 publications

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“…We investigated two types of free-standing CNT films containing either SWCNTs or DWCNTs, which were fabricated as follows. , SWCNTs were collected directly after their synthesis in a floating catalyst chemical vapor deposition reactor onto a microporous filter. Random CNT films were further transferred to a support frame and densified with a solvent .…”

Section: Methodsmentioning

confidence: 99%

“…DWCNT films were first assembled onto a filter from a CNT dispersion by means of vacuum filtration. After filter removal, the DWCNT film floating in solution was transferred onto a support frame to form the pellicle membrane Figure shows the SEM images of (a) SWCNT and (b) DWCNT networks.…”

Section: Methodsmentioning

confidence: 99%

“…After filter removal, the DWCNT film floating in solution was transferred onto a support frame to form the pellicle membrane. 40 Figure 1 shows the SEM images of (a) SWCNT and (b) DWCNT networks. Many individual CNTs form these networks and randomly connect at multiple junctions.…”

Section: Methodsmentioning

confidence: 99%

See 2 more Smart Citations

Enhanced Thermal Conductivity of Free-Standing Double-Walled Carbon Nanotube Networks

Mehew,

Timmermans,

Saleta Reig

et al. 2023

ACS Appl. Mater. Interfaces

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Nanomaterials are driving advances in technology due to their oftentimes superior properties over bulk materials. In particular, their thermal properties become increasingly important as efficient heat dissipation is required to realize high-performance electronic devices, reduce energy consumption, and prevent thermal damage. One application where nanomaterials can play a crucial role is extreme ultraviolet (EUV) lithography, where pellicles that protect the photomask from particle contamination have to be transparent to EUV light, mechanically strong, and thermally conductive in order to withstand the heat associated with high-power EUV radiation. Free-standing carbon nanotube (CNT) films have emerged as candidates due to their high EUV transparency and ability to withstand heat. However, the thermal transport properties of these films are not well understood beyond bulk emissivity measurements. Here, we measure the thermal conductivity of free-standing CNT films using all-optical Raman thermometry at temperatures between 300 and 700 K. We find thermal conductivities up to 50 W m −1 K −1 for films composed of double-walled CNTs, which rises to 257 W m −1 K −1 when considering the CNT network alone. These values are remarkably high for randomly oriented CNT networks, roughly seven times that of single-walled CNT films. The enhanced thermal conduction is due to the additional wall, which likely gives rise to additional heat-carrying phonon modes and provides a certain resilience to defects. Our results demonstrate that free-standing double-walled CNT films efficiently dissipate heat, enhancing our understanding of these promising films and how they are suited to applications in EUV lithography.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

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Enhanced Thermal Conductivity of Free-Standing Double-Walled Carbon Nanotube Networks

Mehew,

Timmermans,

Saleta Reig

et al. 2023

ACS Appl. Mater. Interfaces

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“…With respect to thermal properties, our films survive temperatures of at least 1000 °C without damage. 20) The most important property to examine is the pellicle's durability within actual scanner conditions as well as its chemical resistivity to the ionized and atomized hydrogen atmosphere induced by EUV light. In order to simulate the scanner conditions, the NewSUBARU synchrotron light facility at the University of Hyogo was utilized.…”

Section: Introductionmentioning

confidence: 99%

CNT-based pellicles for the next generation of EUV scanners

Ueda¹,

Lima²,

Harada

et al. 2023

Jpn. J. Appl. Phys.

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There has been growing interest among advanced semiconductor manufacturers in pellicles that can withstand conditions in extreme ultraviolet (EUV) photolithography. The pellicle must have high mechanical toughness, high transparency in EUV radiation, thermal stability, and chemical stability for ionized and atomic hydrogen. For the above expectations, our experience shows that the carbon nanotube (CNT) yields the most promising results due to its outstanding mechanical and thermal properties. We are developing thin, free-standing CNT films for EUV pellicle application using a liquid filtration manufacturing method. This method has the advantage of producing highly uniform films, allowing us to use a variety of CNT types, while avoiding the use of harsh chemicals. To advance our hypothesis, we will examine and discuss EUV radiation durability results evaluated with the NewSUBARU synchrotron light facility.

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