2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) 2013
DOI: 10.1109/vlsi-tsa.2013.6545580
|View full text |Cite
|
Sign up to set email alerts
|

Ultra-low-power switching and complementary resistive switching RRAM by single-stack metal-oxide dielectric

Abstract: This paper reports a metal-oxide RRAM with novel Defect Engineering Technology (DET) that achieves forming-free, multi-level capable, self-rectifying, large 2x10 4 resistance window, ultra-low 0.24nW reset power and good endurance of 10 6 cycles at the same time. Besides, by the same DET with additional forming process, we demonstrate a complementary resistive switching (CRS) on singlestack metal-oxide with large 15X resistance window, good endurance of 10 5 cycles and stable high-temperature disturbance.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 3 publications
(2 reference statements)
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?