2021
DOI: 10.1007/s11771-021-4607-z
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Ultra-low temperature anodic bonding of silicon and glass based on nano-gap dielectric barrier discharge

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Cited by 4 publications
(1 citation statement)
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“…As an important bonding technology in the fabrication of MEMS devices, anodic bonding plays a very important role in the silicon-based wafer level packaging, device level packaging, vacuum packaging and micro-nano packaging, that widely used in the packaging of microaccelerometers, micro-gyros, micro-probes and so forth. [1][2][3][4][5] The anodic bonding can minimize the thermal stress caused by mismatch of thermal expansion coefficient between different kinds of materials. Meanwhile, the anodic bonding also has the advantages of high connecting strength and good sealing performance without intermediate filler to assist though simple processing.…”
Section: Introductionmentioning
confidence: 99%
“…As an important bonding technology in the fabrication of MEMS devices, anodic bonding plays a very important role in the silicon-based wafer level packaging, device level packaging, vacuum packaging and micro-nano packaging, that widely used in the packaging of microaccelerometers, micro-gyros, micro-probes and so forth. [1][2][3][4][5] The anodic bonding can minimize the thermal stress caused by mismatch of thermal expansion coefficient between different kinds of materials. Meanwhile, the anodic bonding also has the advantages of high connecting strength and good sealing performance without intermediate filler to assist though simple processing.…”
Section: Introductionmentioning
confidence: 99%