2012 IEEE Sensors 2012
DOI: 10.1109/icsens.2012.6411370
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Ultra-sensitive NO<inf>2</inf> detection with AlGaN/GaN 2DEG channels for air quality monitoring

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Cited by 3 publications
(3 citation statements)
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“…AlGaN layers with 30% Al concentration contain 5-10 times higher channel sheet densities compared with GaAs or InP HEMTs. By functionalizing the gate area of an HEMT sensor for sensing materials, the AlGaN/GaN sensors have been demonstrated for H 2 [21], CO [22]- [24], NO [25], [26], NO 2 [26]- [28], NH 3 [25], [29], [30], CH 4 [31], H 2 S [32], [33], and C 2 H 2 [34]. So far, very few results of acetone detection with AlGaN/GaN devices have been reported [35].…”
Section: Introductionmentioning
confidence: 99%
“…AlGaN layers with 30% Al concentration contain 5-10 times higher channel sheet densities compared with GaAs or InP HEMTs. By functionalizing the gate area of an HEMT sensor for sensing materials, the AlGaN/GaN sensors have been demonstrated for H 2 [21], CO [22]- [24], NO [25], [26], NO 2 [26]- [28], NH 3 [25], [29], [30], CH 4 [31], H 2 S [32], [33], and C 2 H 2 [34]. So far, very few results of acetone detection with AlGaN/GaN devices have been reported [35].…”
Section: Introductionmentioning
confidence: 99%
“…A locally thinned (20-30 nm) AlGaN barrier recess has also been applied for enhancement mode HEMTs [37], Au-free ohmic contact [38], CMOS compatible ohmic resistance reduction [39] and to improve the sensitivity of HEMT-based sensors [21], [40]- [42]. The AlGaN/GaN recess would be commonly done by reactive ion etching (RIE) using Cl 2 /BCl 3 plasma with low power or thermal oxidation at 650 • C coupled with KOH oxide etching at 70 • C [43].However, the use of dry RIE etching often exhibits difficulties of depth control, non-uniformities, etching residues and lattice damage due to ion bombardment.…”
mentioning
confidence: 99%
“…A gate recess of AlGaN/GaN heterostructure sensor using ICP-RIE dry etching with low-ppb level sensitivity was demonstrated by Peter Offermans et al [21], [22], [42], [46]. However, the current change is nA level and response time is about 30 mins for 100 ppb NO 2 /N 2 , which is not easy for practical application but offer nevertheless indisputably high potential [21], [42]. The authors later developed a gate recess AlGaN/GaN heterostructure sensor integrated a micro-heater.…”
mentioning
confidence: 99%