2018
DOI: 10.1364/optica.5.000884
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Ultra-smooth silicon nitride waveguides based on the Damascene reflow process: fabrication and loss origins

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Cited by 204 publications
(136 citation statements)
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“…For microresonators with no intrinsic losses, conversion efficiency close to 100% is expected. By considering practical microresonators with an intrinsic Q of 10 7 (demonstrated with state-of-the-art silicon nitride integration technique [31], [32], [44]), conversion efficiency around 80% is achievable (see Supplementary Section 7 for more discussions). The super-efficient soliton comb will benefit a wide range of applications including biological and chemical sensing [10], high-capacity and long-haul fiber telecommunications [11], fast ranging lidar [13], [14], microwave photonic signal processing [16], [17], etc.…”
Section: Summary and Discussionmentioning
confidence: 99%
“…For microresonators with no intrinsic losses, conversion efficiency close to 100% is expected. By considering practical microresonators with an intrinsic Q of 10 7 (demonstrated with state-of-the-art silicon nitride integration technique [31], [32], [44]), conversion efficiency around 80% is achievable (see Supplementary Section 7 for more discussions). The super-efficient soliton comb will benefit a wide range of applications including biological and chemical sensing [10], high-capacity and long-haul fiber telecommunications [11], fast ranging lidar [13], [14], microwave photonic signal processing [16], [17], etc.…”
Section: Summary and Discussionmentioning
confidence: 99%
“…The recent progress on high-Q MRR in Si 3 N 4 [31] could also provide an avenue for more complex quantum communication tasks such as multiphoton entanglement swapping experiments, or coupling to quantum memories. An area where significant impact could be made is in better mode matching between the fibre and bus waveguide for fibre pigtailing, which would be important to increase both the coupling and heralding efficiencies.…”
Section: Discussionmentioning
confidence: 99%
“…Then a layer of Si3N4 is deposited on the whole wafer, as well as in the trenches. In this process, the predefined trenches not only prevent the crack from propagating, but also function as the mold of the waveguides [355] [356]. To further reduce the scattering loss and increase quality factor, several different strategies have been employed including optimizing the reactive ion etching (RIE) recipe, performing a reflow step to improve sidewall roughness, and using chemical mechanical polishing (CMP) to reduce top surface roughness.…”
Section: Silicon Nitridementioning
confidence: 99%