Ultra‐smooth single crystal diamond surfaces resulting from implantation and lift‐off processes

Thi, Thu Nhi Tran; Fernandez, Bruno; Eon, David; Gheeraert, Etienne; Härtwig, J.; Lafford, Tamzin; Perrat-Mabilon, A.; Peaucelle, C.; Olivero, P.; Bustarret, Étienne

doi:10.1002/pssa.201100038

Cited by 8 publications

(3 citation statements)

References 11 publications

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“…Alternatively, multiple ion implantations at different depths can be employed to fabricate thinner membranes between two contiguous sacrificial layers . Such membranes are even smoother than the original sample surface, which allows the possibility of employing this method as a polishing technique, or to serially produce tiled membranes for large‐area homoepitaxial CVD growth . More relevantly for quantum technologies, the above‐mentioned membranes provide the ideal substrate that guarantees vertical confinement of light in the subsequent fabrication of waveguides, photonic crystals, or ring resonator structures, either with FIB techniques as described below or by electron beam lithography followed by reactive ion etching.…”

Section: Photonic Components In Diamondmentioning

confidence: 99%

Quantum Micro–Nano Devices Fabricated in Diamond by Femtosecond Laser and Ion Irradiation

et al. 2019

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Diamond has attracted great interest as a quantum technology platform thanks to its optically active nitrogen vacancy (NV) center. The NV's ground state spin can be read out optically, exhibiting long spin coherence times of ≈1 ms even at ambient temperatures. In addition, the energy levels of the NV are sensitive to external fields. These properties make NVs attractive as a scalable platform for efficient nanoscale resolution sensing based on electron spins and for quantum information systems. Diamond photonics enhance optical interactions with NVs, beneficial for both quantum sensing and information. Diamond is also compelling for microfluidic applications due to its outstanding biocompatibility, with sensing functionality provided by NVs. However, it remains a significant challenge to fabricate photonics, NVs, and microfluidics in diamond. In this Progress Report, an overview is provided of ion irradiation and femtosecond laser writing, two promising fabrication methods for diamond‐based quantum technological devices. The unique capabilities of both techniques are described, and the most important fabrication results of color center, optical waveguide, and microfluidics in diamond are reported, with an emphasis on integrated devices aiming toward high performance quantum sensors and quantum information systems of tomorrow.

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Section: Photonic Components In Diamondmentioning

confidence: 99%

Quantum Micro–Nano Devices Fabricated in Diamond by Femtosecond Laser and Ion Irradiation

et al. 2019

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“…The diamond sample was realized in five steps (see figure 1). Firstly (figure 1a), a 3x3x0.5 mm 3 (100) type Ib HPHT diamond substrate is implanted with oxygen ions (3 MeV with 10 17 ions/cm² dose [21,22]). This implantation creates a graphitized zone localized at a depth of 2 µm from the substrate surface as confirmed by 2D confocal Raman spectroscopy (not shown here).…”

Section: Boron-doped Delta-layer In Diamond Samplementioning

confidence: 99%

Front and back side SIMS analysis of boron-doped delta-layer in diamond

Pinault-Thaury

Jomard

Mer-Calfati

et al. 2017

Applied Surface Science

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Nowadays the availability of very thin diamond layers in the range of nanometers as well as the possibility to characterize such delta-layer structures are required for the field of photonics and spintronics, but also for the development of next generation high power devices involving boron doping. The fabrication of diamond structures with abrupt interfaces such as superlattices and quantum wells has been recently improved. A very accurate characterization is then essential even though the analysis of such structures is arduous and challenging. SIMS analyses are commonly used to obtain depth profiles of dopants. However, below 10 nm in thickness, SIMS induced ion mixing effects which are no longer negligible. Then the raw SIMS profile might differ from the real dopant profile. In this study, we have analyzed a diamond structure containing a thin boron epilayer, especially synthetized to achieve SIMS analysis on both sides and to overcome the effects of ion mixing. We evidence the ion mixing induced by primary ions. Such a structure is a delta diamond layer, comparable to classical boron-doped delta-layer in silicon. Our results show that the growth of boron-doped deltalayer in diamond is now well controlled in terms of thickness and interfaces.

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“…Buried graphitic layers produced by high-dose implantation of several hundred keV or MeV and subsequent annealing are the basis of a so-called diamond lift-off process, in which the graphitic layer is etched selectively by a wet acidic solution or by heating in oxygen environment [49]. Free-standing 3D structures may be produced by this method for MEMS and photonics applications [50,51]. Low-energy, 30 keV Ga FIB implantation has also been experimentally investigated by Rubanov and Suvorova [52] and the formation of an approximately 35 nm thick amorphous layer was observed in synthetic diamond (001) samples at ion doses that provided complete amorphization up to the surface.…”

Section: Amorphization and Graphitization Of Diamond Andmentioning

confidence: 99%

Direct-Write Ion Beam Lithography

Joshi‐Imre

Bauerdick

2014

Journal of Nanotechnology

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Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and nanoscale designs on the surface of practically any solid sample material. Based on the type of ion-sample interaction utilized, FIB-based manufacturing can be both subtractive and additive, even in the same processing step. Indeed, the capability of easily creating three-dimensional patterns and shaping objects by milling and deposition is probably the most recognized feature of ion beam lithography (IBL) and micromachining. However, there exist several other techniques, such as ion implantation- and ion damage-based patterning and surface functionalization types of processes that have emerged as valuable additions to the nanofabrication toolkit and that are less widely known. While fabrication throughput, in general, is arguably low due to the serial nature of the direct-writing process, speed is not necessarily a problem in these IBL applications that work with small ion doses. Here we provide a comprehensive review of ion beam lithography in general and a practical guide to the individual IBL techniques developed to date. Special attention is given to applications in nanofabrication.

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Ultra‐smooth single crystal diamond surfaces resulting from implantation and lift‐off processes

Cited by 8 publications

References 11 publications

Quantum Micro–Nano Devices Fabricated in Diamond by Femtosecond Laser and Ion Irradiation

Quantum Micro–Nano Devices Fabricated in Diamond by Femtosecond Laser and Ion Irradiation

Front and back side SIMS analysis of boron-doped delta-layer in diamond

Direct-Write Ion Beam Lithography

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