Ultra-thin and high-aspect-ratio TiN nanosheets

Epitaxial growth of high-aspect-ratio TiN nanosheets on Si (100)

“…Fig. 4 shows that the resulting TiN nanosheet has a symmetric lattice with a hexagonal structure, which is identical to the HRTEM image of a TiN nanosheet sample [10]. Next, because the basic unit of the Si void framework is a square, the two perpendicular directions in Si Table 1 Lattice and domain misfits of TiN planes matched with the Si (1 0 0) plane.…”

“…The obtained product was of high-purity TiN, previously examined by XRD, Raman scatting, ESCA, as well as TEM SAED pattern analysis [10]. A FESEM image of the as-prepared sample is given in Fig.…”

“…1b shows the magnified image of a nanosheet, which is smooth and flexible because it is extremely thin. The TiN nanosheet thickness measured by AFM was around 3.2 nm [10], which yields a high aspect ratio (the ratio between length and thickness) around 3100-4700. Fig.…”

“…[10]. The reactants were TiCl 4 vapors carried by the high-purity nitrogen (99.995%), which was fed into a 1200 1C oven in an Ar atmosphere.…”

“…Recently, we have successfully prepared TiN nanosheets with a high aspect ratio [10]. In this paper, the formation mechanism of TiN nanosheets is proposed based on the anisotropic growth rates of epitaxial growth.…”