2023
DOI: 10.1016/j.jpowsour.2023.233056
|View full text |Cite
|
Sign up to set email alerts
|

Ultra-thin on-chip ALD LiPON capacitors for high frequency application

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 43 publications
0
1
0
Order By: Relevance
“…At the top of this list is lithium phosphorus oxynitride, LiP x O y N z (LiPON), due to its many advantages such as its relatively high ionic conductivity, good electrochemical stability against Li metal, and low enough electronic conductivity. In addition to the aforementioned properties, thin LiPON films are transparent and can be deposited as part of flexible TFBs. , So far, a variety of advanced gas-phase thin-film deposition techniques have been adopted for the growth of LiPON films on planar substrates, including sputtering, pulsed laser deposition (PLD), metal–organic chemical vapor deposition (CVD), and atomic layer deposition (ALD). , The line-of-sight operation mode in both sputtering , and PLD makes them unsuitable for complex 3D geometries. On the other hand, CVD techniquesespecially ALD, which is based on self-saturating surface reactionsare anticipated to yield uniform and conformal coatings on complex 3D structures with large ARs .…”
mentioning
confidence: 99%
“…At the top of this list is lithium phosphorus oxynitride, LiP x O y N z (LiPON), due to its many advantages such as its relatively high ionic conductivity, good electrochemical stability against Li metal, and low enough electronic conductivity. In addition to the aforementioned properties, thin LiPON films are transparent and can be deposited as part of flexible TFBs. , So far, a variety of advanced gas-phase thin-film deposition techniques have been adopted for the growth of LiPON films on planar substrates, including sputtering, pulsed laser deposition (PLD), metal–organic chemical vapor deposition (CVD), and atomic layer deposition (ALD). , The line-of-sight operation mode in both sputtering , and PLD makes them unsuitable for complex 3D geometries. On the other hand, CVD techniquesespecially ALD, which is based on self-saturating surface reactionsare anticipated to yield uniform and conformal coatings on complex 3D structures with large ARs .…”
mentioning
confidence: 99%