2008
DOI: 10.1021/ja801682u
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Ultrafast Electron Transfer Dynamics at NH3/Cu(111) Interfaces: Determination of the Transient Tunneling Barrier

Abstract: Electron transfer (ET) dynamics at molecule-metal interfaces plays a key role in various fields as surface photochemistry or the development of molecular electronic devices. The bare transfer process is often described in terms of tunneling through an interfacial barrier that depends on the distance of the excited electron to the metal substrate. However, a quantitative characterization of such potential barriers is still lacking. In the present time-resolved two-photon photoemission (2PPE) study of amorphous … Show more

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Cited by 29 publications
(43 citation statements)
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“…55 The observed decay times are all faster than 500 pssfar too fast to explain residence times of minutes. Extrapolation of the thickness dependent decay times in amorphous ammonia layers to values reported for crystalline ice structures results in a distance of 16 nm between the excess electron and the metal.…”
Section: Comparison Of Experiments and Theorymentioning
confidence: 95%
“…55 The observed decay times are all faster than 500 pssfar too fast to explain residence times of minutes. Extrapolation of the thickness dependent decay times in amorphous ammonia layers to values reported for crystalline ice structures results in a distance of 16 nm between the excess electron and the metal.…”
Section: Comparison Of Experiments and Theorymentioning
confidence: 95%
“…Here, the electrons always localize at the NH 3 -vacuum interface, as demonstrated by Xe overlayer experiments similar to the ones shown in Figure 16.3 [31]. Assuming that d can be varied systematically and supposing that the resulting transfer probabilities are measured, it would be possible to extract the b and thereby gain information about the tunneling potential.…”
Section: Amorphous Nh 3 On Cu(111)mentioning
confidence: 72%
“…This process of electron solvation (step 2) is accompanied by a binding energy gain and the constriction of the excess electron's wave function that is thus becoming increasingly localized. The molecular rearrangement leads to the formation of an interfacial potential well, 40 comparable to small polaron formation, that leads to a decreased wave function overlap of the excess charge with the metal. In other words, the electron is increasingly screened from the substrate.…”
Section: Resultsmentioning
confidence: 99%
“…As shown in ref. 40 and mentioned further above, the solvated electrons reside at the NH 3 -vacuum interface in the case of amorphous ammonia on Cu(111). This occurrence leads to the observation of residence times of the excited electrons that depend exponentially on the ammonia layer thickness (cf.…”
mentioning
confidence: 82%
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