“…Prior studies have demonstrated the evolution of polycrystalline, textured, and epitaxial microstructures of diverse MO films (e.g., tin‐doped indium oxide (ITO), Ga 2 O 3 , ZnO, TiO 2 , VO 2 , WO 3 , BaSrTiO 3 (BST), Pb(Zr,Ti)O 3 (PZT), La 1− x Sr x MnO 3 (LSMO)) deposited by methods such as chemical solution deposition (CSD), pulsed‐laser deposition (PLD), and sputtering . The large temperature gradients and high diffusion rates during laser processing lead to epitaxial growth rates that are orders of magnitude larger and effective heating times much shorter than that for conventional thermal treatment . Furthermore, the laser irradiation technique has been utilized for processing of complex nanostructures, such as site‐specific growth of nanowires (NWs) (e.g., ZnO, TiO 2 ) and nanorods (NRs) (e.g., Fe 2 O 3 , Ag/ZnO), spatial patterning of nanocrystals (e.g., ZnO) and NWs (e.g., Al 2 O 3 ), fabrication of nanosheets (e.g., Fe 2 O 3 ) and clustered nanostructures (e.g., Ag–ZnS@ZnO, Ag/WO 3− x ), production of oxide nanoparticles (NPs) by laser ablation in liquid (e.g., CuO, MnO x , Y 3 Fe 5 O 12 , Ag/TiO 2 , Y 2 O 3 :Eu 3+ , Gd 2 O 3 :Eu 3+ , Y 3 Al 5 O 12 :Ce 3+ (YAG:Ce), Fe@Fe 2 O 3 , or Fe 3 O 4 ), in situ formation of nanocomposites (e.g., Co 3 O 4 , MoO 2 , and Fe 3 O 4 particles embedded in graphene, ZnO particles embedded in poly(methyl methacrylate)), selective patterning of hybrid electrodes (e.g., Ni/NiO), direct scribing of fine structures (e.g., ITO), and direct writing of microdevices (e.g., TiO 2 , Cu/Cu 2 O).…”