Thermally managed Z-scan performed on ALD grown TiO2 films demonstrated n2 values of 1.7x10-11 and 1.94 x10-10 cm 2 /W for films grown at 100°C and 250°C, respectivelygreater than 1000X that of other growth methods. OCIS codes: (190.0190) Nonlinear optics; (320.0320) Ultrafast optics Development of next-generation high-speed photonics devices, such as ultrafast integrated modulators, require novel materials will large optical nonlinearities [1]-[2]. Established nonlinear materials cut from bulk crystals or liquids are not suitable for integration with CMOS technology. In addition to all-optical on-a-chip device applications, materials that exhibit high nonlinear absorption and a fast response time are useful in optical limiting applications [3] for the protection of optical sensors and the human eye from high intensity light such as lasers [4]. Typical materials proposed in the past for optical limiting have been semiconductors, fullerenes, carbon nanotubes, nanostructured materials such as nanoparticles, graphene, nonlinear absorbers doped in xerogels and sol gel films, glasses, filters, organic/inorganic clusters, as well as 2D atomic crystals and organic dye molecules. For most of these materials, there is a tradeoff between their optical limiting ability and damage thresholds, and response time. The vast majority of these materials are not suitable for covering large-scale areas with consistent reproducibly required for sensitive applications such as infrared counter measures sensors. Therefore, there is a need for CMOScompatible materials with sizable nonlinear optical properties. Thin-films and nanolaminates, grown using atomic layer deposition (ALD), have the potential to meet this need.