Ultrafast third-order optical nonlinearity of noble and transition metal thin films

Kruglyak, V. V.; Hicken, R. J.; Ali, M.; Hickey, B. J.; Pym, A. T. G.; Tanner, B. K.

doi:10.1088/1464-4258/7/2/031

Cited by 17 publications

(11 citation statements)

References 22 publications

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“…They have been used to study many phenomena of fundamental and applied interest such as optical orientation of spin, 1 ultrafast demagnetization, 2 and ultrafast excitation of coherent phonons, 3 and magnons. 4 Their potential for materials characterization is illustrated by measurements of the electronphonon coupling constant in high T c superconductors 5 and metals, 6 hot electron linear and angular momentum relaxation times 7 and nonlinear susceptibility tensor components 8 in metals, and the spin wave mode spectrum of nanomagnets. 9 Significant efforts have been devoted recently to investigations of the kinetics of electron-electron and electronphonon thermalization in metals, deduced from measurements of the transient ͑differential͒ reflectivity and/or transmission.…”

Section: Introductionmentioning

confidence: 99%

Spectroscopic study of optically induced ultrafast electron dynamics in gold

et al. 2007

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Using a supercontinuum pulse as a probe, we have measured the transient reflectivity spectra of a thin film of gold for different values of the pump-probe time delay. The wavelength x at which the measured transient reflectivity changes sign has been found to depend upon the time delay, leading to bipolar time resolved signals. The time dependence of x has been shown to be consistent with calculations that take into account the full dependence of the reflectivity upon the electron occupation number, and to contradict qualitatively a model in which the signal is assumed to be directly proportional to the occupation number. The shift of x has been found to persist at time delays that are much longer than the time required for the electrons to thermalize. Therefore the bipolar reflectivity signals do not necessarily contain a contribution from nonthermalized electrons, as has been previously assumed.

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Section: Introductionmentioning

confidence: 99%

Spectroscopic study of optically induced ultrafast electron dynamics in gold

et al. 2007

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“…In optical pumpprobe experiments, it is known to be responsible for the third order non-linearity [13][14][15], and has been used to study the relaxation of the electron linear and angular momentum [16]. It was proposed that the transient magnetic field associated with circularly polarized laser pulses would be used in all-optical switching of magnetic elements [17,18].…”

Section: Introductionmentioning

confidence: 99%

Use of the Faraday optical transformer for ultrafast magnetization reversal of nanomagnets

2007

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Abstract. We propose a new strategy for ultrafast magnetization reversal of nanomagnets. Due to the Inverse Faraday Effect, circularly polarized optical pulses induce a pulsed magnetic flux in materials with large magneto-optical susceptibility. Alternatively, intense optical pulses can induce a pulsed magnetic flux by means of ultrafast demagnetization of a metallic thin film or multilayer with a perpendicular magnetic anisotropy. The time varying magnetic flux induces a transient electro-motive force and electric current in a conducting loop on the surface of the illuminated material, and hence a transient magnetic field. The magnetic field pulses due to the transient current appear to be too short for use in the magnetic field or spin-current induced precessional switching of magnetization. However, our calculations suggest that the magnetic field could lead to ultrafast switching of a nanomagnet overlaid on the surface of the conductor and demagnetized by the same optical pulse. In the case of magnetic pulses due to the Inverse Faraday Effect, the switching direction could be controlled by the helicity of the optical pulse.

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“…Pd and its alloys have recently been investigated for a variety of applications, including acting as a seed layer for both electroless plating [8] and electroplating [9] in damascene applications, hydrogen storage, [10,11] hydrogen detection, [12] and even as a nonlinear material for ultrafast optically controlled switches. [13] There are many coordination compounds based on b-diketonate chemistries that are suitable for metal ALD; [14,15] however, to date there has been fairly limited success with ALD using metal-organic compound precursors and low process temperatures when deposited on oxide surfaces because of the lack of a suitable reducing agent. Previous work has been undertaken with a plasma reduction scheme by this group [16] and others [1,[17][18][19][20] to enable deposition on various substrates, including oxidized metals at relatively low temperatures.…”

Section: Introductionmentioning

confidence: 99%

Atomic Layer Deposition of Pd on an Oxidized Metal Substrate

Eyck

Pimanpang

Bakhru

et al. 2006

Chem. Vap. Deposition

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A method is presented for the atomic layer deposition (ALD) of palladium on air-exposed tantalum and silicon without the use of a plasma. Palladium can be deposited on these substrates at 80°C using molecular hydrogen and palladium(II) hexafluoroacetylacetonate (Pd II (hfac) 2 ) as the precursor. In the case of palladium deposition on tantalum, the fluorine content is significantly reduced compared to previous results for thermal ALD. Use of a sufficiently long hydrogen pulse eliminates the noble metal substrate requirement typically needed for low deposition temperature ALD, and removes the requirement of plasma for deposition on oxidized metal surfaces. Rutherford backscattering spectrometry (RBS) measurements indicate a correlation between hydrogen pulse time and seed layer deposition rate, which is also substrate dependent. X-ray photoelectron spectroscopy (XPS) measurements indicate high-quality palladium film deposition on tantalum, suggesting the substrate temperature was low enough to prevent dissociation of the hfac ligand and adequate carbon and fluorine scavenging by the atomic hydrogen. The use of thermal ALD as opposed to a plasma process maintains the direction independence and high conformal nature of films produced by ALD, enabling deposition on highly varied topographies and three-dimensional porous structures.

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Ultrafast third-order optical nonlinearity of noble and transition metal thin films

Cited by 17 publications

References 22 publications

Spectroscopic study of optically induced ultrafast electron dynamics in gold

Spectroscopic study of optically induced ultrafast electron dynamics in gold

Use of the Faraday optical transformer for ultrafast magnetization reversal of nanomagnets

Atomic Layer Deposition of Pd on an Oxidized Metal Substrate

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