2004
DOI: 10.1002/adma.200400268
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Ultrahigh Pore Density Nanoporous Films Produced by the Phase Separation of Eutectic Al–Si for Template‐Assisted Growth of Nanowire Array

Abstract: turn changes the effective contrast between the alternating polymer and LC rich layers in the structure. This is a simple and flexible system by which photoresponsive photonic crystals can be fabricated in a single-step process. In addition to the one-dimensionally periodic systems such as those presented here, complex two-and three-dimensionally periodic HPDLC photonic materials could be fabricated [13] with the Azo-LC materials to make dynamic photonic crystals of any structure in a one-step process. Future… Show more

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Cited by 57 publications
(56 citation statements)
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“…The integration of chemical etching and template method was used to widen the nanochannels of porous alumina for production of bone-shaped nanomaterials [12]. Ultra-high pore density nanoporous films have been fabricated via nanophase separation of the eutectic Al-Si system followed by the removal of Al cylinders through chemical etching [13].…”
Section: Introductionmentioning
confidence: 99%
“…The integration of chemical etching and template method was used to widen the nanochannels of porous alumina for production of bone-shaped nanomaterials [12]. Ultra-high pore density nanoporous films have been fabricated via nanophase separation of the eutectic Al-Si system followed by the removal of Al cylinders through chemical etching [13].…”
Section: Introductionmentioning
confidence: 99%
“…Among these materials, phase-separated Al-Si films, composed of Al nanocylinders (nanowires) embedded in an amorphous Si matrix, are very interesting because the fabrication method, co-sputtering deposition from an Al-Si target at growth temperatures less than 100°C, is quite simple and allows the use of various kinds of substrates [9,11]. In addition, the nanoporous material fabricated from the Al-Si film can be used as a template for various kinds of ultrahigh density nanowires [9,12] and nanoporous semiconductor silicon thin films [13]. According to the growth mechanism of phase-separated Al-Si thin films [11], sputtered materials separate into two phases to minimize the total free energy on the growth surface and the evolution of phase separation limited by the film deposition forms an Al nanowire array embedded in an amorphous Si matrix.…”
Section: Introductionmentioning
confidence: 99%
“…The characteristic feature of such material is determined by an extremely small diameter, which is difficult to achieve with conventional lithographic techniques. Several nanowire fabrication processes have been developed by using an inexpensive bottom-up method, such as the recently developed approach in which the deposited materials separate laterally into two phases during film growth [7][8][9]. This interesting phenomenon is being used to create nanowire arrays because there is no need to use a catalyst with this technique.…”
Section: Introductionmentioning
confidence: 99%
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