Colloidal quantum dots (QDs) stand at the forefront of a variety of photonic applications given their narrow spectral bandwidth and near-unity luminescence e ciency. Integrating desired forms of QD lms into photonic systems without compromising their optical or transport characteristics is the key to bridging the gap between expectations and outcomes. Here, we devise a dual-ligand passivation system comprising photocrosslinkable ligands and dispersing ligands to enable QDs to be universally compatible with solution-based patterning techniques. The successful control on the structure of both ligands allows multiscale, direct patterning of the dual-ligand QDs on various substrates via commercialized photolithography (i-line) or inkjet printing systems without compromising the optical properties of QDs or the optoelectronic performances of the devices implementing them. Our approach offers a versatile way of creating various structures of luminescent QDs in a cost-effective and non-destructive manner, and thus enables the implementation of QDs in a range of photonic applications.
MainColloidal quantum dots (QDs) are promising materials for use in next-generation light sources due to their wide-ranging bandgap tunability, narrow spectral bandwidths, and near-unity luminescence quantum yields (QY) [1][2][3][4][5] . Together with the capability of cost-effective solution processing, QDs have become the key light-emissive materials for information displays 3,5−7 . The patterned QD down-conversion layer on blue light-emitting diodes (LEDs) renders high-color reproduction and ultra-high image quality in full-color displays 8,9 . Likewise, a laterally patterned array consisting of red, green, and blue (RGB) QD-LEDs, in which QDs convert electrically pumped charge carriers into photons, allows for excellent color gamut and brightness as well as light-weight, thin, and exible form factors [10][11][12][13] , which are suited for wearable neareye displays for virtual reality (VR) and augmented reality (AR) devices. For these "mixed-reality" applications, the QD deposition process should enable the patterning of RGB QDs (or RG QDs along with the bank) into a few micrometer sub-pixels over a large area with high-precision and high-delity 14,15 . At the same time, the process should not disrupt the optical and transport characteristics of QDs and adjacent functional layers. Moreover, from a practical standpoint, it poses great bene t if one can use equipment that are already deployed in display device manufacturing steps for the patterning process.