There have been tremendous efforts to deposit inorganic fi lms with excellent properties using chemical bath deposition, [18][19][20][21] spray pyrolysis, [ 22,23 ] and other solution-based methods.Among various inorganic semiconductors, metal chalcogenides, particularly, group V-VI compounds have been widely studied for their optoelectrical [ 24,25 ] and thermoelectric properties [ 26,27 ] and successfully utilized in thin fi lm transistors, [ 5,6 ] solar cells, [ 7,24,28 ] thermoelectric devices, [ 29,30 ] photodetectors (PDs), [31][32][33] and phase change memory [ 34 ] applications. These fi lms have typically been prepared via sophisticated deposition techniques such as catalyst-assisted chemical vapor deposition, [ 35 ] sputtering, [ 36 ] thermal evaporation, [ 24,37 ] and molecular beam epitaxy [ 38 ] that require energy-intensive, high vacuum deposition conditions not amenable to high-throughput mass production.Although most metal chalcogenides are very diffi cult to dissolve in common solvents, recent developments in solution-based chemistry of chalcogenides have overcome this limitation, and homogeneous, high-quality semicon-