2017
DOI: 10.1109/tnano.2017.2690400
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Ultrahigh Storage Densities via the Scaling of Patterned Probe Phase-Change Memories

Abstract: Abstract-The scaling potential of patterned probe phasechange memory (PP-PCM) cells is investigated, down to singlenanometer dimensions, using physically realistic simulations that combine electro-thermal modelling with a Gillespie Cellular Automata (GCA) phase-change model. For this study, a trilayer TiN/Ge2Sb2Te5/TiN cell structure (isolated by a SiO2 insulator) was preferred, due to its good performance and practicability, over previously investigated probe-based structures such as those that used diamond-l… Show more

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Cited by 13 publications
(18 citation statements)
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References 26 publications
(26 reference statements)
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“…As contact resistance is mainly determined by the electricial resistivities of probe and capping layer, it is timely to search for a thin capping layer that however allows for a high electrical conductivity and a low thermal conductivity. Triggered by above quest, two additional capping layers that are made of TiN [113], [114] and ITO medium [115] respectively, have most recently been proposed. As suggested from its bottom electrode application, TiN media enables a high electrical conductivity and a relatively low thermal conducitivity under a thickness of 2 nm, satisfying the above requirement.…”
Section: Phase-change Memoriesmentioning
confidence: 99%
“…As contact resistance is mainly determined by the electricial resistivities of probe and capping layer, it is timely to search for a thin capping layer that however allows for a high electrical conductivity and a low thermal conductivity. Triggered by above quest, two additional capping layers that are made of TiN [113], [114] and ITO medium [115] respectively, have most recently been proposed. As suggested from its bottom electrode application, TiN media enables a high electrical conductivity and a relatively low thermal conducitivity under a thickness of 2 nm, satisfying the above requirement.…”
Section: Phase-change Memoriesmentioning
confidence: 99%
“…However, one severe issue of this architecture arises from the presence of excessive temperature inside the DLC capping due to its low thermal conductivity, which may melt the DLC protection layer. In this case, Wright et al has recently proposed an alternative structure that comprise a GST layer with a thickness varying from 5 nm to 50 nm sandwiched by a 10 nm TiN capping and bottom electrode [ 51 ]. In addition, similar to [ 45 ], the GST layer in Wright’s structure is separated by a 20 nm wide SiO 2 insulator to carefully suppress the thermal diffusion effect due to the low thermal conductivity of SiO 2 media, thus allowing for the absence of the crystalline ‘halo’.…”
Section: Current Status Of Phase-change Electrical Probe Memorymentioning
confidence: 99%
“…One of the most intriguing features of PCRAM arises from its multi-level function that was also observed in phase-change electrical probe memory by Yang et al [ 51 ]. As reported in [ 52 ], the test sample consists of a 10 nm amorphous GST layer and a n-type Si substrate deposited on a metal sample holder via an Ag paste, while the probe tip is made of antimony doped Si coated with Pt-Ir.…”
Section: Current Status Of Phase-change Electrical Probe Memorymentioning
confidence: 99%
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“…Such a high interfacial resistance indeed requires a higher electric stimulus for either crystallization or amorphization. Thanks to this, the practicality of utilizing TiN film for both capping and bottom layers has most recently been subjected to some preliminary investigation [7]. Because of its super-high electrical conductivity, the TiN capping layer allows for much lower contact resistance than that with the DLC capping layer, and no evidence of a reaction between TiN and Ge 2 Sb 2 Te 5 has been found to date.…”
Section: Introductionmentioning
confidence: 99%