2022
DOI: 10.1016/j.apmt.2022.101536
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Ultralow dielectric cross-linked silica aerogel nanocomposite films for interconnect technology

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Cited by 18 publications
(15 citation statements)
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“…With the rapid progress of high-frequency microwave communication technologies, an urgent need for high-performance low-dielectric materials has risen. These dielectric materials with low dielectric constant can decrease the capacitance between metal interconnects, resistance–capacitance delay, line-to-line crosstalk noise, and power dissipation, which makes them suitable as high-frequency, low-loss boards; semiconductor packaging materials (e.g., chip modules); and interlayer dielectrics (e.g., transistor devices) [ 1 , 2 , 3 , 4 , 5 , 6 , 7 , 8 ]. For example, dielectrics in printed circuit boards must have a dielectric constant ( k ) value of <2.5 and a dissipation factor of <0.002 at frequencies greater than 5 GHz in order to meet the criteria of 5G mobile communication in terms of reliability and signal delay [ 9 , 10 , 11 ].…”
Section: Introductionmentioning
confidence: 99%
“…With the rapid progress of high-frequency microwave communication technologies, an urgent need for high-performance low-dielectric materials has risen. These dielectric materials with low dielectric constant can decrease the capacitance between metal interconnects, resistance–capacitance delay, line-to-line crosstalk noise, and power dissipation, which makes them suitable as high-frequency, low-loss boards; semiconductor packaging materials (e.g., chip modules); and interlayer dielectrics (e.g., transistor devices) [ 1 , 2 , 3 , 4 , 5 , 6 , 7 , 8 ]. For example, dielectrics in printed circuit boards must have a dielectric constant ( k ) value of <2.5 and a dissipation factor of <0.002 at frequencies greater than 5 GHz in order to meet the criteria of 5G mobile communication in terms of reliability and signal delay [ 9 , 10 , 11 ].…”
Section: Introductionmentioning
confidence: 99%
“…As one of the most effective ways to greatly reduce the dielectric constant of materials, the introduction of porous structure is often involved because it can accommodate a large amount of air with the lowest dielectric constant. [19][20][21][22][23] 23 A metal-organic framework of [Cu 3 (BTC) 2 ] n with highly porous structure was incorporated into cellulose nanofibrils through the solution-based strategy to prepare an ultra-low dielectric films. 24 PI aerogels in which dodecyldiamine in place of dimethylbenzidine were also prepared.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5] Such dielectric materials reduce capacitance, resistive delay, wire-to-wire crosstalk noise and power consumption between metal interconnects, 6,7 and provides significant application prospects in interlayer dielectrics, semiconductor packaging and high-frequency, low-loss boards. [8][9][10] Compared with inorganic dielectric materials, organic polymers have a lower dielectric constant, a low density and excellent processing and molding properties. 2,11 More importantly, organic polymers can modulate properties through flexible molecular design.…”
Section: Introductionmentioning
confidence: 99%