2020
DOI: 10.1002/adfm.201909262
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Ultrathin Amorphous Silica Membrane Enhances Proton Transfer across Solid‐to‐Solid Interfaces of Stacked Metal Oxide Nanolayers while Blocking Oxygen

Abstract: A large jump of proton transfer rates across solid‐to‐solid interfaces by inserting an ultrathin amorphous silica layer into stacked metal oxide nanolayers is discovered using electrochemical impedance spectroscopy and Fourier‐transform infrared reflection absorption spectroscopy (FT‐IRRAS). The triple stacked nanolayers of Co3O4, SiO2, and TiO2 prepared by atomic layer deposition (ALD) enable a proton flux of 2400 ± 60 s−1 nm−2 (pH 4, room temperature), while a single TiO2 (5 nm) layer exhibits a threefold lo… Show more

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Cited by 29 publications
(46 citation statements)
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“…2, and infrared evidence for the complete removal of residual organic Si precursor ligands shown in Figure 2(a) of a previous publication. 8 Figure 7 (2) and (3)) as described in detail in a previous report 8 and reproduced for convenience as Figure S3 in this paper. The 21 transverse (TO) SiOSi mode gives rise to shoulders in the 1150-1050 cm -1 region, 8 but is strongly overlapped here by SiOCo stretch modes of the Si(-O-Co) 3 anchor moiety of the wire with maximum at 1139 cm -1 and shoulders at 1107 and 1050 cm -1 (Figure 7(a), trace (1)).…”
Section: Embedding Into Silicamentioning
confidence: 92%
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“…2, and infrared evidence for the complete removal of residual organic Si precursor ligands shown in Figure 2(a) of a previous publication. 8 Figure 7 (2) and (3)) as described in detail in a previous report 8 and reproduced for convenience as Figure S3 in this paper. The 21 transverse (TO) SiOSi mode gives rise to shoulders in the 1150-1050 cm -1 region, 8 but is strongly overlapped here by SiOCo stretch modes of the Si(-O-Co) 3 anchor moiety of the wire with maximum at 1139 cm -1 and shoulders at 1107 and 1050 cm -1 (Figure 7(a), trace (1)).…”
Section: Embedding Into Silicamentioning
confidence: 92%
“…8 Figure 7 (2) and (3)) as described in detail in a previous report 8 and reproduced for convenience as Figure S3 in this paper. The 21 transverse (TO) SiOSi mode gives rise to shoulders in the 1150-1050 cm -1 region, 8 but is strongly overlapped here by SiOCo stretch modes of the Si(-O-Co) 3 anchor moiety of the wire with maximum at 1139 cm -1 and shoulders at 1107 and 1050 cm -1 (Figure 7(a), trace (1)). Comparison of the intensity of the 1235 cm -1 silica band for 20 cycle and 40 cycle layers shows that the silica absorbance grows linearly with numbers of ALD cycles, providing a convenient measure of the relative amounts of silica deposited.…”
Section: Embedding Into Silicamentioning
confidence: 92%
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“…Hence, the flow of protons generated by H 2 O oxidation on the Co 3 O 4 surface through the oxide nanowall to the sites of CO 2 reduction on the opposite side does not pose efficiency limitations under artificial photosynthesis conditions. 18 While motivated by the specific Co 3 O 4 -SiO 2 core-shell nanotube system described above, maximizing controlled charge transfer through embedded molecular wires for driving a catalyst on the opposite side of an ultrathin silica separation membrane may open up the efficient coupling of incompatible redox catalysis environments of systems of various designs. The task requires optimization of the coupling and energetic alignment of light absorber, wire, and catalyst.…”
Section: Introductionmentioning
confidence: 99%
“…Compared to these conventional synthesis techniques, atomic layer deposition (ALD) enables accurate control at the atomic scale without damaging the structure of the original matrix [9,[14][15][16]. Although ALD has been widely applied to metal-oxide deposition, such as SiO 2 [17][18][19], TiO 2 [20][21][22][23][24], and VO x [9,[25][26][27][28][29], there are only very few studies on the deposition of vanadia and titania on mesoporous SBA-15 [30], and its application to NH 3 -SCR [29].…”
Section: Introductionmentioning
confidence: 99%