2019
DOI: 10.1021/acs.langmuir.9b02654
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Ultrathin Chromia on a Hexagonally-Ordered d0 Ferromagnet: Evidence of Interfacial Exchange Bias at the Cr2O3/TiO2–x Interface

Abstract: Heterostructures consisting of 10 Å thick chromia films and 50 Å thick titania films display significant exchange bias at and above room temperature. Chromia films ∼10 Å thick were deposited by molecular beam epitaxy (MBE) of Cr at room temperature in ultrahigh vacuum on 50 Å thick TiO2–x (111) films (x < 0.3) also deposited epitaxially by MBE on Al2O3(0001). Cr deposition yields increased Ti­(III) formation in the titania substrate and the formation of a Cr2O3 overlayer, without Cr/Ti interfacial mixing, as d… Show more

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Cited by 2 publications
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“…Two different forms of PVD include molecular beam epitaxy (MBE) [2] and magnetron sputter deposition-discussed here. MBE is often used for the formation of highly ordered films of rigorously controlled stoichiometry [3]. Magnetron sputtering, however, typically exhibits higher film deposition rates, and good repeatability, albeit with often the formation of polycrystalline films [1] 1…”
mentioning
confidence: 99%
“…Two different forms of PVD include molecular beam epitaxy (MBE) [2] and magnetron sputter deposition-discussed here. MBE is often used for the formation of highly ordered films of rigorously controlled stoichiometry [3]. Magnetron sputtering, however, typically exhibits higher film deposition rates, and good repeatability, albeit with often the formation of polycrystalline films [1] 1…”
mentioning
confidence: 99%