2024
DOI: 10.3390/cryst14020190
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Ultrathin Encapsulation Strategies with Predefined Gate Dielectric Surface Area for Flexible Crystalline Silicon Nanomembrane-Based MOS Capacitors

Zhuofan Wang,
Hongliang Lu,
Yuming Zhang
et al.

Abstract: Ultrathin encapsulation strategies show huge potential in wearable and implantable electronics. However, insightful efforts are still needed to improve the electrical and mechanical characteristics of encapsulated devices. This work introduces Al2O3/alucone nanolaminates using hybrid atomic/molecular layer deposition for ultrathin encapsulation structures employed in crystalline silicon nanomembrane (Si NM)-based metal-oxide-semiconductor capacitors (MOSCAPs). The comprehensive electrical and mechanical analys… Show more

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