Ultrathin resist pattern transfer process by filling mask material in the resist pattern

Kato, H.; Matsunaga, Kanta; Abe, J.; Onishi, Y.

doi:10.1109/imnc.2002.1178654

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers.

DOI: 10.1109/imnc.2002.1178654

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Ultrathin resist pattern transfer process by filling mask material in the resist pattern

H. Kato¹,

Kanta Matsunaga²,

J. Abe³

et al.

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Ultrathin resist pattern transfer process by filling mask material in the resist pattern

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