Ultraviolet‐Induced Deposition of SiO2 Film from Tetraethoxysilane Spin‐Coated on Si

Abstract

We have previously proposed a method for depositing silicon dioxide films on Si from tetraethoxysilane Si(OC2H~)4 (TEOS) using ultraviolet (UV) light from a low pressure mercury lamp. In the method, an organic solution which contains TEOS is spin-coated onto a Si wafer surface to form a thin organic film which is then exposed to the UV light to synthesize silicon dioxide. The photochemical reactions responsible for the oxide formation and the thermal properties of deposited films have been investigated using infrared (IR) and UV absorption spectroscopy and thermal desorption spectroscopy (TDS). IR and UV absorption data confirm that the UV light decomposes organic compounds in the spin-coated organic film to conve~'t the film into a silicon dioxide film. We show that some photochemical reactions responsible for the decomposition of organic compounds are two-step processes. TDS data demonstrate that the deposited film is stable from substrate heating to approximately 400~

Atmospheric Pressure Glow Discharge Deposition of Polysiloxane and SiOx Films

“…One common approach employed to overcome this limitation has been to use low pressure glow discharge methods such as plasma enhanced CVD (PECVD) , and remote plasma enhanced CVD (RPECVD). , The prerequisite vacuum necessary for these processes makes them expensive and limited to batch treatments. UV irradiation and UV/ozone treatment are viable alternatives capable of operating at atmospheric pressure and low temperature; however, film growth typically tends to be slow.…”

Interaction of Photons with Polymers: From Surface Modification to Ablation

“…Cross‐linked poly(siloxane)s possess unique mechanical, nearly ideal elastomer and optical properties, low weight, high durability, high gas permeability and excellent water repellency 177,178. The modification of the hydrophobic PDMS to hydrophilic SiO x opens an additional wide range of applications i.e., in microelectronics179–181 and coating technology for medical devices 182–184. Transformation of PDMS into a SiO x structure has been achieved by irradiation with a Xe 2 excimer lamp at 172 nm in air 172–174.…”

Surface Potential of Magnesium Oxide Thin Films Prepared by Metal Organic Decomposition MOD

“…The MgO thin films were investigated by thermal programmed desorption (TPD) to determine the amounts of H 2 O and CO 2 generated after heating. TPD is an excellent technique for analyzing gases adsorbed on the surfaces of bulk materials and films, and for analyzing the species that evolve from the components of film samples and from the surfaces and subsurfaces of bulk samples [10][11][12][13][14][15][16]. Thus, TPD is a useful method for investigating ceramic powder surfaces and thin films.…”