We studied the optical absorption induced by 4.7eV pulsed laser radiation on Ge-doped a-SiO 2 synthesized by a sol-gel technique. The absorption spectra in the ultraviolet spectral range were measured during and after the end of irradiation with an in situ technique, evidencing the growth of an absorption signal whose profile is characterized by two main peaks near 4.5eV and 5.7eV and whose shape depends on time. Electron spin resonance measurements performed ex situ a few hours after the end of exposure permit to complete the information acquired by optical absorption by detection of the paramagnetic Ge(1) (GeO 4 ) -and Ge-E' (≡Ge•) centers laser-induced in the samples.1 Introduction. Many studies have evidenced that laser exposure of Ge-doped silica is able to induce transparency loss, photosensitivity and optical nonlinearity in the material, related to generation and conversion of point defects triggered by laser light and highly interesting from an applicative point of view [1-2]. These processes have been extensively studied with multiple spectroscopic techniques, such as optical absorption (OA) and electron spin resonance (ESR) but many questions still remain open [3][4][5][6][7][8][9]; in particular, their kinetics during and after laser irradiation has not been sufficiently investigated, due to the lack of appropriate in situ techniques, which allow to evidence transient features of the spectroscopic signals inaccessible to ex situ observation. Also, the attribution of the absorption bands to the known Ge-related defects is still an open problem. In this work, we studied the OA induced by 4.7eV pulsed laser radiation on Ge-doped a-SiO 2 synthesized by a sol-gel technique. OA spectra in the UV (3-6eV) were measured during and after the end of irradiation with an in situ technique, revealing the growth of an absorption profile featuring at least two bands peaked near 4.5eV and 5.7eV and the partial bleaching of the native 5.1eV absorption. A time dependence during and after the end of irradiation of both intensity and shape of the induced OA is evidenced. Finally, ESR measurements performed ex situ a few hours after the end of exposure permit to identify the paramagnetic defects laser-induced in the samples.