Ultraviolet induced transformation of polysiloxane films

Joubert, O.; Hollinger, G.; Fiori, C.; Devine, R. A. B.; Paniez, Patrick Jean; Pantel, R.

doi:10.1063/1.348880

Cited by 28 publications

(23 citation statements)

References 6 publications

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“…[10] In the present work, we extend the systematic study of how PHMS surfaces can be modified with respect to chemical composition and wettability, by exploring the influence of O 2 -plasma treatments. The motivation for this work is manifold: we wanted to prepare a material which (i) can be deposited as a thin film with high (close to atomic) smoothness; (ii) whose wettability properties can be modified from hydrophobic to fully wetting, without affecting the film smoothness significantly; (iii) as limit case, has SiO x (x ≈ 2) like character; and (iv) where these properties can be maintained over relevant experimental or application times (aging aspects).…”

Section: Introductionmentioning

confidence: 99%

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Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiO_x surfaces

Satriano

Marletta

Kasemo

2008

Surface & Interface Analysis

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Atomically flat films of poly(hydroxymethyl)siloxane (PHMS) were modified at surfaces by oxygen-plasma treatments and characterized by several surface sensitive techniques. The purpose was to develop well-characterized films with SiO x surface properties for various applications.The unmodified and plasma-treated PHMS films were investigated by angular resolved XPS (ARXPS in situ in the plasma equipment), Fourier transformed infrared spectroscopy (FTIR), atomic force microscopy (AFM), and contact angle (CA) measurements. The surface chemical composition and wettability underwent pronounced changes upon plasma treatment, while there was no significant change of the original flatness, and both pristine and plasma-treated surfaces exhibited average roughness values below 0.5 nm.The pristine PHMS surface, having a pronounced hydrophobic character, due to the predominance of methyl groups at the surface-air interface, became progressively more hydrophilic for increasing O 2 -plasma treatment times, due to the formation of SiO x C y (x → 2, y → 0) phases, resulting in a wetting angle of 20• for the longer plasma-treatment times (60-600 s). The observed wetting angle character was correlated with the carbon (C) and oxygen (O) content at the polymer surface. Aging of the plasma-treated surfaces was done in air and water, which produced quite different stable wetting angles. After a sufficiently long plasma-treatment time (≥60 s) a stable wetting angle of 20• -25 • was measured, nearly the same as on the freshly plasma-oxidized surfaces. In contrast, storage in pure water, after the same plasma treatment, gave stable contact angles of 5• or lower. Possible reasons for this difference are discussed.

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Section: Introductionmentioning

confidence: 99%

“…[7 -9] Another established way of converting such films to silica (SiO 2 ) is by purely thermal treatment in an oxidizing atmosphere. [10] This requires temperatures above 1000…”

Section: Introductionmentioning

confidence: 99%

Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiO_x surfaces

Satriano

Marletta

Kasemo

2008

Surface & Interface Analysis

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“…Cross‐linked poly(siloxane)s possess unique mechanical, nearly ideal elastomer and optical properties, low weight, high durability, high gas permeability and excellent water repellency 177,178. The modification of the hydrophobic PDMS to hydrophilic SiO x opens an additional wide range of applications i.e., in microelectronics179–181 and coating technology for medical devices 182–184. Transformation of PDMS into a SiO x structure has been achieved by irradiation with a Xe 2 excimer lamp at 172 nm in air 172–174.…”

Section: Discussionmentioning

confidence: 99%

Interaction of Photons with Polymers: From Surface Modification to Ablation

Lippert

2005

Plasma Processes & Polymers

138

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Summary: This work reviews the interaction of photons with polymers with an emphasis on UV laser ablation and surface modification using VUV lamps. Laser ablation of polymers is an established process in industrial applications, but the mechanisms of ablation are still controversial. Different polymers, such as poly(methyl methacrylate), polyimides and specially designed polymers are used as examples to show that the mechanism is a mixture of photochemical and photothermal features which are closely related to the polymer structure and properties. Different approaches to probe the ablation mechanisms and to improve ablation are discussed. Photoactive groups have been introduced into the polymer structure to improve the quality of ablation and to elucidate the ablation mechanisms. The experimental techniques to probe the ablation mechanism range from time‐resolved measurements, such as shadowgraphy, ToF‐MS, and ns‐surface interferometry to variations of the irradiation wavelengths and pulse lengths. The necessity for a critical evaluation of the experimental procedures and analysis is discussed exemplary for polyimides. The data for different types of polyimides are mixed up and some experimental procedures are possibly causing problems for the data evaluation. Various recent trends for laser ablation, such as ultrafast ablation or VUV ablation are also discussed. Surface modifications of polymers using VUV photons from lamps are discussed for oxidation and nitriding of poly dimethylsiloxane (PDMS) and polyolefines. The mechanism of the PDMS surface oxidation is presented in detail.

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“…UV-laser treatment of silicone materials has been studied at wavelengths of 193 nm, 248 nm, and 266 nm [Hogan and Lunney (1988), Joubert et al (1991), Graubner et al (2002), Rubahn et al (2004), Graubner et al (2006)]. The laser modification results of silicone at three wavelengths have been compared by Okoshi et al (2009): irradiation at 266 nm leads to the formation of carbon; irradiation at 193 nm leads to a luminescent material (defective SiO x ) [Okoshi et al (2007)], and at 157 nm the resulting material is SiO 2 .…”

Section: Introductionmentioning

confidence: 99%

Laser Fabrication of Silica Gratings by Ablation and Modification of Silicone Films

2014

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Silicone (polydimethylsiloxane) films are irradiated with a nanosecond F 2 -laser at a wavelength of 157 nm. Low fluence irradiation < 100 mJ/cm² causes elimination of the organic groups leading to the formation of silica like material. Irradiation at fluences > 200 mJ/cm² causes precise ablation of the silicone material. By combining ablative patterning and low fluence modification, the fabrication of silica devices with precise shape control is possible. Using spin coating of a diluted silicone solution (type ACCUGLASS), the preparation of thin silicone films (100 nm to 1 μm thickness) is possible. High resolution patterns like surface relief gratings with 1 μm period are obtained in these films by patterned ablation using a mask projection system and subsequent large area irradiation for the modification to silica. The chemical modification to carbon free silica is confirmed by Raman spectroscopy.

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Ultraviolet induced transformation of polysiloxane films

Cited by 28 publications

References 6 publications

Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiO_x surfaces

Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiO_x surfaces

Interaction of Photons with Polymers: From Surface Modification to Ablation

Laser Fabrication of Silica Gratings by Ablation and Modification of Silicone Films

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Ultraviolet induced transformation of polysiloxane films

Cited by 28 publications

References 6 publications

Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiOx surfaces

Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiOx surfaces

Interaction of Photons with Polymers: From Surface Modification to Ablation

Laser Fabrication of Silica Gratings by Ablation and Modification of Silicone Films

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Product

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Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiO_x surfaces

Oxygen plasma‐induced conversion of polysiloxane into hydrophilic and smooth SiO_x surfaces